Stanford's RAITH150 system has just been upgraded with Raith's unique Fixed Beam Moving Stage () capability. In this context, Raith and the Stanford Nanofabrication Facility cordially invite you to attend the Advanced Nanolithography Workshop. This one day workshop will be dedicated to advanced patterning techniques that have been implemented by Raith for both electron and ion beam lithography to enhance nanoscale fabrication beyond traditional vector scan patterning.
Please use the link below to automatically register for the workshop. As space is limited, we hope that you can confirm as soon as possible.
When
Wednesday February 15th, 2012
Where
Allen Building Auditorium (ALLEN 101X), Stanford University
Time
9:00 AM - 5:00 PM
If you have any questions, please contact Raith USA.
