Raith Micrograph Award

Due to this consideration Raith has introduced the annual Raith Micrograph Award for highly sophisticated scientific application within Raith customers' community.

To participate in the award you should submit up to three micrographs of applications showing nanostructures which were created using a Raith ion or electron beam lithography system (ionLiNE, e_LiNE, RAITH150, RAITH150-TWO, RAITH50, PIONEER or ELPHY). Multiple submissions are welcomed, provided that each submission covers a different application and the micrographs within a submission all cover the same application. Please note, each single submission requires a new registration. In addition to your address details, a micrograph description as well as a brief overview about your scientific motivation is to be specified. We also accept pictures showing "accidents" as long as they are displaying a unique nano- or microstructure.

All Raith electron beam system and Raith SEM attachment users can participate, except Raith staff members or Raith partners staff members. Submissions may be used for marketing purposes.