Raith Micrograph 2008

Dear participants, please accept our best thanks for your participation at Raith's Micrograph Award for highly sophisticated and scientific applications.

Raith is very pleased with the users' enormous interest in this event and their fantastic submissions every year. Since 2004, when Raith has started this event, deciding on the winner has always been a brainteaser for the jury and to "their regret" the Raith Micrograph Award 2008 has not been an exception. To cope with all the submitted micrographs as much as possible, the jury agreed on picking three "Special Art Award" winners.

Focussing on the criterion uniqueness of nanostructure, the quality of the image as well as the description of the work, we are glad to declare the winners of this award:

Sunghyun Jo / University of Michigan, USA

1kb crosspoint RRAM (Resistive Random Access Memory).

Boris Desiatov, Ilya Goykhman, Yigal Lilach, Uriel Levy / Hebrew University, Jerusalem

Silicon waveguide with embedded photonic crystal suspended in air.

Joel Yang / Massachusetts Institute of Technology (MIT), USA

Zoom of nested L structure for testing the resolution capabilities of hydrogen silsesquioxane (HSQ) negative tone resist and Raith150-TWO electron beam lithography tool.

Weihua Han / Institute of Semiconductors, Beijing, China

Silicon crystal-facet-dependent nanostructure fabricated on a (100)-oriented silicon-on-insulator wafer.

Alexandru Vlad / University of Louvain, Belgium

Single-step 3D electron beam lithography processing.

Mehmet Deniz Caliskan / Bilkent University, Turkey

GaN nanowire grown by MOCVD technique on a patterned metal seed on a sapphire substrate.