e_LiNE plus is an ultra high resolution electron beam lithography system and multi-application nanoengineering workstation.
With the e_LiNE plus, innovative research now has access to a modularly expandable research tool uniting the worlds of advanced electron beam lithography (EBL), nanoengineering, and ultra high resolution imaging & analysis. e_LiNE plus is the only EBL system which ideally combines the "classical workhorse" EBL with capabilities of a multi-application tool without compromising on state of the art lithography specifications. Still, the e_LiNE plus is pushing chip- and waferscale EBL performance in the R&D tool category.
Distinct from other multiapplication tools conceptually built around analytical microscopy, e_LiNE plus is the only system that can professionally handle complex patterning and nanofabrication tasks. The e_LiNE plus with a dedicated lithography system architecture and a state-of-the-art laserinterferometer controlled stage ensures movement and pattern placement accuracies in the nm-regime - an undeniable prerequisite for a professional lithography tool ! Above all, a smart stage control electronics allows for a unique patterning mode: Fixed beam moving stage (). Using FBMS, fabrication of completely kink-free elongated structures of arbitrary curvature with zero error is possible.
Stable thermal field emission filament technology, automated height and focus control, and a flexible software with unthought of possibilities - unquestioned and widely confirmed - complement the professional EBL infrastructure of e_LiNE plus.
By this innovative concept and technology only, Raith delivers a fully integrated solution for automated large area applications with highest precision - on samples up to 4inch!