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PIONEER

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'Write & View'

Raith PIONEER is a new compact electron beam lithography (EBL) system based on thermal field emission (TFE) technology.

With sub 20nm lithography, highest resolution imaging capabilities and very low cost of ownership, the PIONEER is the ideal choice if you are looking for an uncompromised and affordable solution for fabrication and inspection of nanostructures. The PIONEER is the first true EBL/SEM hybrid available!
Compared to a state of the art SEM with a third-party pattern generator, the PIONEER is a complete turnkey EBL system from a single trusted vendor at a very competitive price. The PIONEER's highest grade ingredients enable much wider application bandwidth: Raith´s most recent laser interferometer controlled stage technology, which is a must for a dedicated EBL system, now provides integrated "on board" rotation and tilt of the entire sample holder thus preserving full SEM imaging capability.
Unique InLens detector hardware significantly improves secondary electron collection efficiency for brightly high contrast imaging and symmetric mark recognition. Especially at low voltages this detector delivers excellent surface information.
PIONEER is intuitive and easy to use with a smart multi-user management system in order to avoid "interference" between numerous users of different skill levels especially in a university environment.
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Electron beam lithography system_PIONEER_pic1.jpg
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PIONEER - New compact EBL system based on TFE technology
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