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bd nav_pfeil_grsolutions nav_pfeil_grLithography & nanoengineering nav_pfeil_grRAITH150-TWO  back_navzeile_rechts
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RAITH150-TWO

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...a unique combination of Ultra High Resolution e-beam lithography and UHR result inspection

Writing mode

  • Sub 10 nm lithography
  • Unsurpassed mark recognition technology
  • Automatic loadlock
  • Up to 7" mask / 8" wafer handling
  • Automatic focus correction
  • Automatic sample leveling
  • Unique zero exposure mode ()
  • Most comprehensive user interface

Inspection mode

  • UHR inspection for
    • Process development and control
    • Pattern and device metrology
  • Various rotation and tilt angles
  • Intuitive sample navigation

For more information, please download the product brochure and/or contact our local sales office.
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RAITH150-TWO brochure PDF
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Zero stitching error using Fixed Beam Moving Stage (FBMS) mode PDF
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Multi-project wafer scale process for productive research and development PDF
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References
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Gallery
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Small batch production_RAITH150-TWO_pic4.jpg
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Transition: Pure research to small batch production
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Electron beam lithography applications_RAITH150-TWO_pic5.jpg
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High aspect ratio nanostructure in resist (>1:10) - Würzburg University, Germany
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Electron beam lithography applications_RAITH150-TWO_pic6.jpg
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High aspect ratio GaAs pillars - P. Paulitschke, LMU München, Germany
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