e_LiNE is a ultra high resolution electron beam lithography system and nanoengineering workstation for universities and other academic institutions.
Selected options for nanomanipulation, and expand this system to a versatile nano-engineering workstation. The state-of-the-art e_LiNE electron column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID.
Lithography on 4 inch samples
In-situ electrical measurements and nanomanipulation, e.g. CNT or nanorods