Raith GmbH
Home Raith GmbH
Legal notice
Visitors info
SiteMap
Raith GmbH
Raith GmbH
Raith GmbH
To start page
Raith GmbH Raith GmbHRaith GmbH
Raith GmbH English Chinese - temporary disabled Raith GmbH
Raith GmbH
Raith Logo
Raith GmbH
Raith GmbH Raith GmbH
kopf_pfeil bd_gr bd kopf_registration
bd
bd
bdkopf_pfeil
bd bd_hb bd
Navigation
bd_hb
nav_pfeil_db Lithography & nanoengineering
bd_hb
nav_pfeil_db VOYAGER
bd_hb
nav_pfeil_db RAITH150-TWO
bd_hb
nav_pfeil_db e_LiNE plus
bd_hb
nav_pfeil_db PIONEER
bd_hb
nav_pfeil_db ionLiNE
bd_hb
nav_pfeil_db traxx
bd_hb
nav_pfeil_db periodixx
bd_hb
nav_pfeil_db TwinLITH
bd_hb
nav_pfeil_db SEM & FIB lithography kits
bd_hb
nav_pfeil_db Semiconductor navigation
bd_hb
bd_hb
Navigation
bd_hb
nav_pfeil_db News
bd_hb
nav_pfeil_db About Raith
bd_hb
nav_pfeil_db Jobs
bd_hb
nav_pfeil_db Offices & representatives
bd_hb
nav_pfeil_db References
bd_hb
nav_pfeil_db Events
bd_hb
nav_pfeil_db Courses
bd_hb

bd_hb
nav_sitesearch
bd_hb
bd
bd nav_pfeil_grsolutions nav_pfeil_grLithography & nanoengineering nav_pfeil_gre_LiNE plus nav_pfeil_gre_LiNE plus launch  back_navzeile_rechts
bd
bd

e_LiNE plus - NEW PRODUCT

bd

'Nanofabrication beyond electron beam lithography'

e_LiNE plus is an ultra high resolution electron beam lithography system and multi-application nanoengineering workstation.

With the e_LiNE plus, innovative research now has access to a modularly expandable research tool uniting the worlds of advanced electron beam lithography (EBL), nanoengineering, and ultra high resolution imaging & analysis.
e_LiNE plus is the only EBL system which ideally combines the "classical workhorse" EBL with capabilities of a multi-application tool without compromising on state of the art lithography specifications
The vision for advanced R&D required these additional in-situ functions, for applications such as direct electrical measurements, mechanical probing of nanostructures, and gas assisted deposition and etching processes.
The new e_LiNE plus is the consequent evolution of the best selling e_LiNE with additional process techniques, functionality, accessories and improved specifications that meet the standard of today´s EBL requirements!
FOR MORE INFO ON e_LiNE plus, please follow the links below!


What's new with e_LiNE plus? It's an extension of Raith's bestselling e_LiNE...

  • plus improved EBL performance specs, now
    • linewidth 10nm min. guaranteed
    • minimum grating periodicity 40nm lines & spaces guaranteed
  • plus improved max. patterning speed, now 20MHz
  • plus new accessories, e.g.:
    • Alternative single injection line gas delivery system for efficient FEBIP
    • "Nanofinger" for profilometry
    • Sample cooling/heating
    • and more …
  • plus new detector availability:
    • inlens EsB and AsB detector for improved mark recognition and imaging with material contrast
    • STEM detector for ultra high imaging resolution with dark field & bright field information
  • plus new 3D process development and inspection module
  • plus new acoustic design
  • plus latest Raith NanoSuite Software
bd
bd
bd
bd
nav_pfeil_gr
nav_pfeil_gr
nav_pfeil_gr
nav_pfeil_gr
nav_pfeil_gr
nav_pfeil_gr
bd
printopt
bd
bd graue_linie_verlauf bd
Electron beam lithography system_e_LiNE plus_pic1.jpg
bd
e_LiNE plus - Nanofabrication beyond electron beam lithography
bd
Electron beam lithography applications_e_LiNE plus_pic2.jpg
bd
Ultra High Resolution: 9nm lines exposed in HSQ resist at 20 keV
bd
Electron beam lithography applications_e_LiNE plus_pic4.jpg
bd
Advanced EBL: Photonic crystal structure in membrane (underetched) - William Whelan-Curtin, University of St. Andrews, UK
bd
Electron beam lithography applications_e_LiNE plus_pic6.jpg
bd
4 nanomanipulator-driven tungsten tips under visual SEM-inspection mode control
bd
Electron beam lithography applications_e_LiNE plus_pic7.jpg
bd
Nanoprobing of freely suspended Pt-nanowire, deposited on gold contact pads with EBID
bd
Electron beam lithography applications_FEBIP_e_LiNE plus_pic2.jpg
bd
Star-like 3D-EBID test pattern, surface diffusion dominated growth due to regional precursor depletion
bd
Electron beam lithography applications_e_LiNE plus_pic5.gif
bd
Manipulation of EBID nano structures
bd
bd
latest news
bd bd_gr bd
nav_pfeil_gr bd bd VOYAGER - New High-Speed Electron Beam Lithography System bd
nav_pfeil_gr bd bd E-MRS 2013 bd
nav_pfeil_gr bd bd EIPBN 2013 bd
nav_pfeil_gr bd bd SEM 2013 bd
nav_pfeil_gr bd bd EuroNanoForum2013 bd
nav_pfeil_gr bd bd NANO TR-9 bd
bd
ask us!
bd bd_gr bd
bd bd bd Sales bd
nav_pfeil_gr bd bd Europe bd
nav_pfeil_gr bd bd America bd
nav_pfeil_gr bd bd Asia/Pacific bd
bd bd_gr bd
bd bd bd Support bd
nav_pfeil_gr bd bd Europe bd
nav_pfeil_gr bd bd America bd
nav_pfeil_gr bd bd Asia/Pacific bd
bd bd_gr bd
nav_pfeil_gr bd bd Contact your
representative
bd
bd bd bd
  bd
bd bd_gr bd
nav_pfeil_gr_1 bd
bd bd_gr bd
nav_pfeil_gr bd bd Email your questions about >e_LiNE plus - NEW PRODUCT< bd
bd bd_gr bd
nav_pfeil_gr bd bd Download Raith >Info letter< bd
bd