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bd nav_pfeil_grsolutions nav_pfeil_grSEM & FIB lithography kits nav_pfeil_grELPHY MultiBeam  back_navzeile_rechts
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ELPHY MultiBeam

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The nanopatterning benchmark for upgrading your FIB-SEM

ELPHY MultiBeam is the pattern generator optimized for electron and ion beam techniques.
It delivers true lithographic performance on an analytical FIB-SEM instrument by combining the newest evolutions in multi technique nanofabrication and 3D Ion Beam Lithography (IBL) with the best Electron Beam Lithography (EBL) performance available for upgrades.

ELPHY MultiBeam includes all comprehensive multiple technique nanopatterning functionality in a single tool for

  • Focused Ion Beam Milling, Etching and Deposition
  • Ion Beam Lithography (IBL)
  • Electron Beam Lithography (EBL)
  • Gas assisted Focused Electron Beam Induced Processing (FEBIP)
  • Helium Ion Beam Patterning
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ELPHY MultiBeam
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...the flexible writing strategy
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