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Glossary

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Secure Socket Layer

SSL is a cryptographically communications protocol which provide secure communications on the Internet for such things as web browsing, e-mail, Internet faxing, instant messaging and other data transfers.
Information on GeoTrust SSL certificate used on Raith website: http://www.geotrust.com/reseller/signing_services.asp

Value Added Tax


Please see VAT number below.

Value Added Tax


With the introduction of the single market on 1st January 1993, fiscal customs based controls at internal frontiers were abolished and a new VAT control system was put in place for intra-Community trade. Under the new VAT system intra-Community supplies of goods are exempt from VAT in the Member State of despatch when they are made to a taxable person in another Member State who will account for the VAT on arrival. Therefore any taxable person making such supplies must be able to check quickly and easily that their customers in another Member State are taxable persons and do hold a valid VAT identification number.
Limited electron beam scan deflection range is overcome by combination of stage movement and e-beam scanning. Large pattern of mm or cm size are divided into smaller fields, typically of 50, 100 or 200 µm and exposed in serial mode to reconstruct the original sized pattern. This is called stitching. Stage movement is 50, 100 or 200 µm to adjacent field. The remaining error along the small field borders due to stage positioning and distortion of beam deflection is called stitching error.
Patterns written after subsequent process step should be overlaid and precisely aligned to previously fabricated pattern.
Process combination of e-beam lithography and optical lithography: High resolution electron beam lithography pattern are precisely aligned into existing pattern (mostly pattern made by optical lithography) on a substrate. Combines high resolution of electron beam and high productivity of optical lithography.
As the electrons penetrate through the resist into the substrate, they occasionally undergo large angle scattering events (backscattering). The backscattered electrons cause the proximity effect, where the dose that a pattern feature receives is affected by electrons scattering from other features nearby. The net result of the electron scattering is that the dose delivered by the electron beam tool is not confined to the shapes that the tool writes, resulting in pattern specific line width variations known as the proximity effect.
Source: SPIE HANDBOOK OF MICROLITHOGRAPHY

Graphic Data System II

GDSII, also known as "Calma Stream", was originally developed by the Calma division of General Electric. Rights to the Calma products have changed hands several times, and are now owned by Cadence Design Systems. GDSII is by far the most stable, comprehensive, and widely used format for lithography. GDSII is a binary format that supports a hierarchical library of structures (called "cells").
Source: SPIE HANDBOOK OF MICROLITHOGRAPHY

Caltech Intermediate Format

The Caltech Intermediate Format, or CIF 2.0, is specified officially in A Guide to LSI Implementation, Second Edition, by R. W. Hon and C. H. Sequin, and a nearly identical description appears in Introduction to VLSI Systems, by C. Mead and L. Conway. This format is far simpler than GDSII and has the advantage that it is readable, using only ASCII characters.
Source: SPIE HANDBOOK OF MICROLITHOGRAPHY

Drawing eXchange Format

DXF format is produced by the program AutoCAD as well as by a number of other inexpensive CAD programs for Windows/DOS and the Macintosh. These programs were not designed for lithography and so contain structures (e.g. three-dimensional figures) that have no meaning in this area. DXF is useful only after it has been translated into GDSII or any other e-beam related format.
Source: SPIE HANDBOOK OF MICROLITHOGRAPHY

Fixed Beam Moving Stage

FBMS exposure strategy that does not follow conventional step and repeat approach. Sample is moved by constant velocity relative to the beam along an arbitrary shaped path of mm or cm length. No stitching errors are induced into the pattern. Ideal for waveguide pattern.

Electron Beam Induced Deposition

Precursors heated above vapor pressure are delivered by a gas injector unit close to the sample surface. Electron or ion beam cracks the gas molecules into volatile and deposit. Various precursors can be used for different deposit composition: e.g. Tungsten, Platinum, Si0x

Electron Beam Induced Etching

Material can be removed by a controlled gas flow near the point of electron penetration into the substrate.
Nanomanipulators are used for making electrical contact to nano structures. They also serve for mechanical probing of nano structures. The nanomanipulators are mounted inside the chamber and are not connected to the stage - thus allowing access to any position even on very large samples.
This is a removable substage with mechanical arrangement for two more degrees of freedom in rotation and tilt to allow sample inspection.

Digital Signal Processor

A digital signal processor (DSP) is a specialized microprocessor designed specifically for digital signal processing, generally in real-time.
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© 2014 by Raith GmbH