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bd nav_pfeil_grsolutions nav_pfeil_grLithography & nanoengineering nav_pfeil_grPIONEER launch  back_navzeile_rechts
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PIONEER - NEW PRODUCT

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From writing in stone...

...to pioneering solutions in nanofabrication

Raith's new Compact High Resolution Electron Beam Lithography System complements the widely used Raith portfolio of lithography and nanofabrication tools.

Raith PIONEER is a new compact electron beam lithography (EBL) system based on thermal field emission (TFE) technology.
With sub 20nm lithography, highest resolution imaging capabilities and very low cost of ownership, the PIONEER is the ideal choice if you are looking for an uncompromised and affordable solution for fabrication and inspection of nanostructures.
The PIONEER is the first true EBL/SEM hybrid available!
Compared to a state of the art SEM with a third-party pattern generator, the PIONEER is a complete turnkey EBL system from a single trusted vendor at a very competitive price. The PIONEER's highest grade ingredients enable much wider application bandwidth:
  • Raith´s most recent laser interferometer controlled stage technology, which is a must for a dedicated EBL system, now provides integrated "on board" rotation and tilt of the entire sample holder thus preserving full SEM imaging capability.
  • The PIONEER is intuitive and easy to use with a smart multi-user management system to avoid "interference" between numerous users of different skill levels, which is especially useful in a university environment.
  • The PIONEER´s flexibility makes it compatible with the widest range of scientific applications in nano and microfabrication.
Whereas the PIONEER is the perfect choice for WRITE & VIEW applications on smaller samples up to 2 inches, the Raith e_LiNE is the solution for nanofabrication applications on 4 inch wafers and masks.
Moreover, the e_LiNE is the only system which offers additional integrated functions for the Fixed Beam Moving Stage () exposure mode, automated height sensing, nanomanipulation, nanoprobing, electron beam induced deposition and etching processes, multiple electron detectors and chemical analysis.
Thus researches have already called the e_LiNE the `Swiss Army Knife for Nanofabrication´.

To learn more about new PIONEER, please follow the links below.

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Electron beam lithography system_PIONEER_pic1.jpg
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PIONEER - `Write & View´
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Tilt rotation function_PIONEER_pic1.jpg
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Integrated Rotation / Tilt function
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Electron beam lithography application_PIONEER_pic2.jpg
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T. Dillon, University of Delaware, USA
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Electron beam lithography application_PIONEER_pic3.jpg
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Magnetic resonance sensor, G. Schmidt et al., Würzburg University, Germany
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Electron beam lithography application_PIONEER_pic4.jpg
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Defect holes in photonic crystal, ZMNS, TU Vienna, Austria
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