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ionLiNE

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FIB Nanopatterning at Its Excellence - Ion Beam Lithography

Raith's ionLiNE (TM) is the world's only nanofabrication system, using the strengths of a focused ion beam and lithography system architecture.
It combines various focused ion beam techniques with unrivaled stability, automation, high resolution, and reproducibility of a lithography instrument.
With Raith's unique NanoFIB-TWO nanofabrication column, its Laser Interferometer Stage and a dedicated lithography software providing excellent handling users know from Raith's Electron Beam Lithography systems ionLiNE is peerless.

Ion Beam Lithography (IBL) adds to the nanofabrication process in many ways and at various steps: IBL is not limited to resist based lithography and mostly employs direct patterning techniques like milling, etching or deposition as well as direct masking including hard masking, implantation or functionalization.


In a Class of Its Own: True Ion Beam Lithography

Repeat accurate results.

  • Highly precise and stable 100 mm laser interferometer stage for non-destructive navigation and large area patterning
  • Proprietary NanoFIB-TWO ion column with excellent resolution, beam spot characteristics (small beam tails) and accurate beam deflection
  • Proven lithography software for precise beam control
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Ion Beam Lithography_ionLiNE_pic0.jpg
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ionLiNE
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Ion beam lithography applications_pic0b.jpg
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NanoFIB(TM) technology of long-term stable ion source and dedicated nanofabrication column
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Ion beam lithography applications_ionLiNE_pic1.jpg
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Large area patterning and stitching (Trinity College Dublin)
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Ion beam lithography applications_pic2a.jpg
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Ion beam lithography applications_pic2b.jpg
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Ion beam lithography applications_pic2.jpg
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Sub-20 nm nanopores on a 4 inch wafer of membrane devices (Imperial College London)
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