The nanopatterning benchmark for upgrading your FIB-SEMELPHY MultiBeam is the pattern generator optimized for electron and ion beam techniques. It delivers true lithographic performance on an analytical FIB-SEM instrument by combining the newest evolutions in multi technique nanofabrication and 3D Ion Beam Lithography (IBL) with the best Electron Beam Lithography (EBL) performance available for upgrades. ELPHY MultiBeam includes all comprehensive multiple technique nanopatterning functionality in a single tool for- Focused Ion Beam Milling, Etching and Deposition
- Ion Beam Lithography (IBL)
- Electron Beam Lithography (EBL)
- Gas assisted Focused Electron Beam Induced Processing (FEBIP)
- Helium Ion Beam Patterning
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