Lithography & nanoengineering
SEM & FIB lithography kits
ELPHY
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Quantum
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SEM & FIB lithography kits
ELPHY Quantum
ELPHY Quantum
ELPHY
software features
Hierarchical fully integrated
GDSII
layout editor/viewer
Data import for
DXF
,
CIF
and ASCII data
Exposure parameter adjustment and calculation
Macro generation and VB scripting
Digital image acquisition
Line width measurement capabilities
SEM/FIB remote control and FIB module
A second offline licence is included
Optional: Fully integrated
proximity effect
correction and parameter calculation
ELPHY
Quantum
hardware features
Writing speed 6 MHz
TTL - blanking signal output
TTL - SEM/FIB external scan enable/disable
TTL signal for FIB/SEM external beam control request
3 additional DAC per channel alignment and calibration ( hardware for scaling, rotation / orthogonality and shift)
previous page
2/2
ELPHY brochure
Installation requirements and useful options for SEM lithography
References
Gallery
Download Adobe Acrobat Reader
Nanotechnology
Nanolithography
Nanopatterning
Focused ion beam
VOYAGER - New High-Speed Electron Beam Lithography System
E-MRS 2013
EIPBN 2013
SEM 2013
EuroNanoForum2013
NANO TR-9
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Email your questions about >ELPHY Quantum<
Download Raith >Info letter<