We are proud to present VELION, the new FIB-SEM for FIB-centric nanofabrication. With its unique set-up of a vertical FIB-column it allows for versatile use in four different operation modes. Find out all about the FIB-SEM where FIB truly comes first
Nanofabrication at its best –
Broadest portfolio of nanoinstruments available
As a world leading manufacturer of nanofabrication instrumentation, Raith helps customers in achieving great results in their field of work. Offering over 35 years of experience and an international service and support structure, Raith supplies the best solutions for nanofabrication, electron beam lithography, FIB-SEM nanofabrication, nanoengineering, IC reverse engineering and life sciences applications. Be at the top of the game in your area of expertise, with the best Raith solution for realizing your application.
Contact us or get to know more about the Raith company, and you’ll be convinced we are the best partner for anybody working in the nanofabrication world.
So much more than Electron Beam Lithography
Raith offers the widest range of nanofabrication solutions available on the market. The company’s unique portfolio of products and services span upgrades for existing microscopy systems, various types of turnkey systems in electron beam lithography, and solutions for FIB-SEM nanofabrication and reverse engineering.
Whatever the requirements of the nanofabrication challenge you are facing, our portfolio offers the ideal solution.
The areas of applications and fields that use Raith systems could hardly be more diverse; from fundamental research in nanophysics and nanomedicine, optoelectronics and material science to quantum technology, the possibilities are endless. Here are a few examples to give you an idea of what our customers are achieving with Raith system technology.
Get together with other nanofabrication experts and learn how a Raith solution may help solve your nanofabrication task.
We adapted our annual Nano Seminar and are offering the Raith European Nano Seminar in the UK for the first time!
Do you want to learn the basics of Electron Beam Lithography? Has your trained staff left and you are looking for a seamless and cost effective transition?
Then our LTC - Electron Beam Lithography Training Course is exactly the right choice for you. In several sessions the participants complete an offline software training and practical exposure training at EBL systems. The next course start on February 27th. Sign up now
Congratulation to our customers at Karlsruhe Institute of Technology (KIT) who received the Gips-Schüle Research Award for the World’s Smallest Photodetector!
Sascha Mühlbrandt, Christian Koos, and Manfred Kohl of KIT’s Institute of Microtechnology/Institute of Photonics and Quantum Electronics were honored for their work on plasmonic photodetectors which combine an ultra-compact footprint with electro-optical bandwidths of hundreds of GHz.
More detailed information can be found in the paper "Silicon-plasmonic internal-photoemission detector for 40 Gbit/s data reception" which was published in Optica: https://doi.org/10.1364/OPTICA.3.000741
With the EBPG5200 at IMT the record-breaking ultracompact devices can be fabricated within a week. Nowadays their architecture can even be expanded from three to four layers which is only possible due to the high overlay accuracy of the patterning system. We are excited for our customers and eager to see where the research will lead in the future.
Time lapse video
DFB laser grating writing newly defined
The easiest nanolithography software user interface now available
Raith's new Multi Sample exposure package simplifies and consolidates exposures of multiple samples from different users and user levels in a single run. It offers easy access to nanolithography for users with or without experience in electron beam lithography and is a big step towards a nano-printer.
ionLiNE Plus proofs unique capabilities
A research group headed by Prof. Weibo Gao at Nanyang Technological University in Singapore, in cooperation with the Raith application team, has recently shown that ion implantation with a focused Si++ ion beam can be employed for creating active silicon vacancies in SiC.
New partnership strengthens global sales activities for unique ZEISS ORION NanoFab platform
Watch the video showing the use of the VOYAGER at the University of Iowa
Read about exciting research, impressive results or technical details in our Download section. We have provided a selection of application notes, product brochures, newsletters, and more to provide you even deeper insights into the nanofabrication world. Browse our Download section and download the PDFs.