Market Introduction of new eLINE Plus

Raith markets the new eLINE Plus, a consequent evolution of the popular eLINE with additional process techniques, functionality and improved specifications. It is the only professional EBL system which ideally combines the "classical workhorse" EBL with capabilities of a multi-application tool.

New ELPHY MultiBeam

The new ELPHY MultiBeam enhances the successful ELPHYattachment series. With its dedicated hard- and software enhancements the new attachment enables maximum nano patterning performance from FIB-SEM intruments.

Introduction of PIONEER

Raith introduces the PIONEER to the market. PIONEER is a new compact electron beam lithography system based on thermal field emission (TFE) technology and is the first true EBL/SEM hybrid available.

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