Raith instruments users should publish and share their interesting results and attractive micrographs with the large international user community.
How to enter
To participate in the award you should submit up to three micrographs of applications showing nanostructures which were created using Raith ion or electron beam lithography systems. Multiple submissions are welcomed, provided that each submission covers a different application and the micrographs within a submission all cover the same application. Please note, each single submission requires a new registration. In addition to your address details, a micrograph description as well as a brief overview about your scientific motivation is to be specified. We also accept pictures showing "accidents" as long as they are displaying a unique nano- or microstructure.
Condition of participation
All Raith electron beam system and Raith SEM attachment users can participate, except Raith staff members or Raith partners staff members. Submissions may be used for marketing purposes.
The Raith application team will decide the winner of the award and apply the following criteria for the three most attractive micrographs
- Uniqueness of nano structure
- Technical quality of the image
- Description of micrograph
Raith will sponsor the participation of an international nanotechnology related conference including flight and accommodation.
All Micrographs must be admitted latest by September 21st 2018