Downloads: Scientific Poster
Sketch & Peel Method with Gold and Silicon Focused Ion Beams
The novel simplified and very fast technique called “sketch & peel” is presented with FIB employing Au and Si ion beams. When cutting only the outline of e.g. plasmonic features in a gold layer with intentionally bad adhesion, one can remove the large gold parts by scotch tape method. This work allows for patterning large areas in a very fast and still resistless way and is based on a collaboration with Hunan University.
The merging of cathodoluminescence spectroscopy and electron beam lithography for the innovative inspection and fabrication of optical devices is being discussed by studying nanodiamonds dropcasted on a silicon chip.
Reference markers for e-beam lithography by Electron Beam Induced Deposition
In order to functionalize nano-materials like grapheneflakes or nano-wires through electron-beam patterning, reference markers on the substrate are necessary. An alternative to the common cumberstone process is presented: Electron Induced Deposition (EBID) allows the marker fabrication and imaging for selecting the flakes/wires in the same system the patterning is done and therefore offers a much more straight-forward approach.