Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
March 13th, 2019
IST Austria, Am campus 1, 3400 Klosterneuburg, Austria
This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
Registration fee: participation is free for registered, academic participants. Industrial suppliers will be charged (participation fee €250)
Deadline for registration: March 4th, 2019