Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Date

March 13th, 2019

Location

IST Austria, Am campus 1, 3400 Klosterneuburg, Austria


Description

This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.


Information:

Registration fee: participation is free for registered, academic participants. Industrial suppliers will be charged (participation fee €250)

Deadline for registration:  March 4th, 2019

Contact person:

Christina Wagner
Phone: +49 (0)231 / 95004 - 133
 

Agenda:

Download final PDF Agenda

Registration:

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