Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Date

May 16th, 2018

Location

Kavli Nanolab Delft; Lorentzweg 1, 2628 CJ Delft ; The Netherlands


Description

This symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities.


Registration:

Registration fee: participation is free for registered participants

Deadline for registration:  April 30th, 2018

Contact person:

Christel Rückstein
Phone: +49 (0)231 / 95004 - 110
 

Agenda:

Download PDF Agenda

 

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