Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
May 16th, 2018
Kavli Nanolab Delft; Lorentzweg 1, 2628 CJ Delft ; The Netherlands
This symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; we also welcome researchers from industry and other universities.
Registration fee: participation is free for registered participants
Deadline for registration: April 30th, 2018