Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
February 18th- 19th 2020
4th Physics Institute and Research Center SCoPE
University of Stuttgart
Hörsaal V57.02 & Raum 2.136
This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genysis and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
Registration fee: participation is free for registered participants.
Deadline for registration: February 6th, 2020