Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Date

February  18th- 19th 2020

Location

4th Physics Institute and Research Center SCoPE
University of Stuttgart
Pfaffenwaldring 57
Hörsaal V57.02 & Raum 2.136
D-70569 Stuttgart
Germany


Description

This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genisys and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.


Information:

Registration fee: participation is free for registered participants. 

Deadline for registration:  February 6th, 2020

Contact person:

Christina Wagner
Phone: +49 (0)231 / 95004 - 133
 

Agenda:

Download Agenda here

Registration is closed. We look forward to seeing you in Stuttgart!

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