Raith offers different workshops for users and operators who have already gained some wider experience with Raith systems.

Electron Beam Lithography Workshop I: Proximity effect and correction

Concept

The purpose of this workshop is to establish a deeper understanding of the proximity effect (PE) in electron beam lithography.

The physical background of the effect is explained briefly, as well as methods to avoid the influence of the PE. Another focus is the usage of Raith software package for proximity effect correction.

After the workshop the participants should be able to estimate the impact of the PE to their application and know either how to circumvent the effect or how to correct the dose distribution of their pattern.


Topics

  • General explanation of proximity effect in electron beam lithography (talk)
  • Introduction to Raith proximity effect correction software (talk & off-line session)
  • Correction of participants' GDSII designs (off-line session)
  • Exposure of the participants` patterns and investigation of the results (practical session)
  • Determination of proximity effect parameters (talk & practical session)

Location

Raith head office in Dortmund, Germany


Appointment

May 07th -08th, 2019

Fee

1,190.00 Euro total (incl. 19% VAT)

Cancellation policy: less than four calendar weeks prior to course 50% refund, less than one calendar week prior to course no refund.

Contact Person

Guido Piaszenski

Phone: +49 (0)231 / 95004 - 114

Email: guido.piaszenski@raith.de

 

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