Concept
This Workshop will enable the trainee to provide the substrate and the resist for an ultra-high resolution EBL process based on HSQ as well as to expose the resist for sub 10nm linewidth and perform the inspection of these features.
During the theory session of the workshop the user will learn about the principles of the substrate treatment and the resist exposure and development.
The first practical session in the lab will enable the trainee to necessary the Si-surface preparations and will show how to handle the resist regarding spin coating, film thickness measurement and storing.
During the second practical session it will be shown the principles of a high resolution exposure and development of the resist. Finally the resist will be inspected.
Combine the HSQ workshop with the LTC (Lithography Training Course) and also learn about the basics of electron beam lithography.
Location
Raith head office in Dortmund, Germany
Organisation
Minimum 5 attendees, practical groups not more than 3 people, two days course
Appointment
Workshops are offered upon request. Please get in touch with us to find a suitable date.
Fee
1,490.00 Euro total (incl. 19% VAT) including training materials (digital format only) and lunch and coffee breaks on both days.
2,390 Euro for the combination of the HSQ workshop and the LTC (Lithography Training Course)
Cancellation policy: less than four calendar weeks prior to course 50% refund, less than one calendar week prior to course no refund.
Optional training add on: different development procedures (NaOH, TMAH, predevelopment baking, etc.) ½ day (375€ / 498€)
Contact Person
Nicolas Pyka
Phone: +49 (0)231 95004 - 118
Email: nicolas.pyka@raith.de