New Application Note on efficient volume production of periodic nanostructures

The Raith EBPG at Paul Scherrer Institute in Switzerland is used by the Swiss startup company Eulitha to write various kinds of photomasks for the efficient fabrication of periodic nanostructures ranging over large areas. The newly released application note explains how a Raith EBPG was used to write the photomasks, which were then used on Eulitha’s PhableR 100 to achieve high reproducibility at high throughput with minimum stitching errors.

Download the application note for more details about efficient volume production of periodic nanostructures.

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