Raith showcases its FIB and Large Area Imaging technology at MNE and EMC 2016
“Nanometer Precision for Fabrication and Microscopy” was the company´s motto at this year´s EMC, which took place in Lyon from August 28 to September 2.
Raith´s CHIPSCANNER technology underlines this main focus at EMC. It can be used for large area imaging and scanning electron microscopy in semiconductor reverse engineering, material science, and life sciences.
High-resolution, large-area image mosaics are created by capturing sequential SEM images and stitching them together for further analysis, while the laser interferometer stage and field-of-view calibration minimize overlap and concomitant computing.
Also, high resolution and versatile FIB Nanofabrication by Raith´s new ionLINE Plus system was proudly presented at MNE conference in Vienna (September 19-23) and is therefore an essential topic in any discussion of nanometer precision for Fabrication and Microscopy. Raith showcased its product enhancements during the conference. New ionLINE Plus delivers outstanding performance and is ready for future technologies. Its record low beam tails enable users to fabricate smallest structures beyond gallium.
“The microscopy community is now recognizing Raith's advancements in FIB Nanofabrication and Large Area Imaging. EMC was a great forum for discussing related application requirements with eager scientists from the fields of both semiconductors and life sciences,” says Dirk Brüggemann, Vice President Sales and Marketing at Raith GmbH.
These and other topics were also discussed during the Raith User Meeting, the annual event that initiates and sustains communication among EBL and FIB Nanofabrication users. Users showed their current work in application-oriented presentations and discussed their results during the meeting onsite.
Raith also sponsored the Poster Award at the MNE, where the best posters in the categories of Micro- and Nanopatterning, Life Science and Biology, Micro- and Nanofabrication, and Micro/Nano Devices and Systems were honored.