Raith, the global leading manufacturer of nanofabrication instrumentation, has delivered its VELION system to the Center for Materials and Microsystems of FBK – Fondazione Bruno Kessler in Trento, Italy, a research institute that aims at results of excellence in science and technology with particular emphasis on interdisciplinary approaches and their applicative dimension.
Symposium on Direct Write, Optical, Ion and Electron Beam Lithography
Join us for a symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the University of Stuttgart from February 18-19, 2020.
This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genysis and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
Don't miss the opportunity to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines and sign up now