Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.
Read how the newly discovered method opens new possibilities for nanopatterning here:
Join us for a symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the TU Delft on May 16th.
The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.
Don't miss the opportunity to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines and sign up now
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