New possibilities for nanopatterning: Application Note on Organic Ice Resist

Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.

Read how the newly discovered method opens new possibilities for nanopatterning here:

Micrograph Award winner success story

Paul Kim from the University of Alberta, Canada, our recent Micrograph Award winner redeemed his prize and took a trip to the École de physique des Houches in France. Read the whole success story here:

5 reasons why Raith EBL systems offer the best solution for fast and easy DFB laser fabrication

The need for DFB laser is continuously increasing and with it the need to create precise gratings fast and easy. Find out the 5 reasons why Raith's EBL tools are proven as the best way to tackle the challenges given by DFB laser makers here:

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