Symposium at Stanford University on direct-write applications - a huge success

Raith and Heidelberg Instruments recently organized a symposium on direct write, optical, ion and electron beam lithography in close collaboration with their joint customer Stanford Nanofabrication Facility (SNF). 

Read all about it here:

New CHIPSCANNER brochure available

Learn everything you need to know about the large-area 3D SEM imaging solution CHIPSCANNER in the updated and extended new CHIPSCANNER Series System Product Brochure or here.

Download it here

New Multi Sample Exposure Package

Raith's new Multi Sample exposure package simplifies and consolidates exposures of multiple samples from different users and user levels in a single run. It offers easy access to nanolithography for users with or without experience in electron beam lithography and is a big step towards a nano-printer.

Find out how your nanolithography job can now get done easier and faster than ever before

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