New publication on quantum technology

A research group headed by Prof. Weibo Gao at Nanyang Technological University in Singapore, in cooperation with the Raith application team, has recently shown that ion implantation with a focused Si++ ion beam can be employed for creating active silicon vacancies in SiC.

Read more about how the ionLINE Plus permitted the scalable fabrication with a dose control down to a few ions per spot.

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ZEISS and Raith join forces for Helium Ion Microscopy and Nanofabrication

The Microscopy business group of ZEISS and the Raith Group agreed to unite their sales and promotional activities for ZEISS ORION NanoFab, the only helium-ion-microscope in the world. ORION NanoFab fabricates sub-10 nm structures and images at 0.5 nm.

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