Review paper available: Comparison of technologies for nano device prototyping with focus on ion beams

Nano devices are becoming increasingly important in various disciplines including electronics, optics, and medicine. But before they can be made available in or as commercial products, prototypes need to be manufactured to realize and assess ideas and theories for the final nano device. Those prototypes may need very different approaches than those used in the final nano device fabrication. A review by Dr. Lars Bruchhaus et al. compares the four most common techniques used for nano device prototyping (NDP), electron beam lithography, self-organized 3D epitaxy, atomic probe microscopy, and ion beam techniques. The review focuses on the latter, while taking a closer look at ion beam techniques based upon liquid metal (alloy) ion sources, given that recent developments have significantly increased their applicability for NDP. The review was recently published by the American Institute of Physics (AIP).

To read the whole article, download it here or visit our Download site. A German summary can also be found under

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