Raith goes Microscopy
Large Area SEM imaging is an area of expertise for which Raith is not originally known. However, simply by reversing the functionality, a Raith EBL tool already has all the functions for large area imaging “on board” - in conjunction with the full scope of application knowledge in EBL, multiple highly efficient electron detectors, and the high sample positioning accuracy that can be achieved with the laser interferometer stage. Given this, we were present at two important microscopy conferences in recent months.
Microscopy & Microanalysis, St. Louis
Raith attended Microscopy & Microanalysis 2017 (M&M) in St. Louis, MO, USA, from August 6-10, 2017. The company made three contributions to the scientific program at the conference, covering topics including “FIB nanofabrication for plasmonics and photonics” and “FIB nanowriter developments: Challenging the paradigm, progress, and perspectives.” A series of “lunch & learn” lessons were also offered, giving interested visitors the opportunity to explore subjects such as “Large area SEM for automated inspection, ‘CD SEM-like’ metrology, and reverse engineering,“ “Nano-FIB technologies for engraving at the nanoscale” and “Focused ion beam and electron beam lithography for nanofabrication.”
In addition, a booth presentation showcased the capabilities of the nanoengineering EBL tool eLINE plus, and a live demo of the eLINE Plus system at the Missouri University was held. Thanks go to Professor F. Scott Miller and Dr. Clarissa Wisner for hosting all of us.
Many interested visitors attended the various presentation events, and plenty of lively discussions took place. As a consequence, the M&M was a great success. We are already looking forward to the next time in Baltimore.
Microscopy Conference, Lausanne
A few days later the European microscopy community gathered for this year’s Microscopy Conference in Lausanne. The topics covered were naturally similar to the M&M, and a booth presentation was given on the topic of “eLINE Plus for EBL, large-area SEM inspection, CAD navigation and overlay, CD SEM-like metrology, and accurate SEM image stitching.” A variety of activities held at the Raith booth invited interested visitors to investigate the possibilities in large-area imaging offered by Raith. With plentiful interesting discussions, the conference was a good opportunity to engage in the microscopy community.
The next edition will be the International Microscopy Conference, held in Sydney, Australia, and we are looking forward to meeting you there!
We will once again have “I love Nano” T-shirts for anyone who missed picking one up at our booth in Lausanne!