New nanopatterning possibilities using Organic Ice Resist – read our new application note

Newly developed Organic Ice Resist can be employed for lithographic negative-tone direct write processes. The technique is similar to additive manufacturing, also known as 3D printing, and offers new possibilities compared to traditional nanopatterning methods like electron beam lithography (EBL), Focused Electron-Beam-Induced Deposition (FEBID), and ice lithography.

OIR patterning

Our customer Anpan Han and his group from the DTU (Technical University of Denmark) in Copenhagen explain the recently established method in a newly released application note. The note highlights the advantages of the Organic Ice Resist approach, which eliminates the solvent development and drying required for EBL and thus allows for further sample processing, even in situ.

Download the application note here or visit our download site to find out the advantages of Organic Ice Resist patterning compared to traditional nanopatterning methods.

Back to Overview

Login as registered user: