From old to new – UMS exchanges EBPG after 28 years
“Besides our volume production, that is done on fully optical gate approach, we need a higher process flexibility for some of our advanced GaAs and GaN products with a perfect resolution,” explains Hüseyin Sahin, Manager Electron Beam Lithography at UMS. The Ulm-based German-French group is specialized in the development of gallium arsenide / gallium nitride semiconductor technologies and the production of corresponding components for telecommunications, automotive, defense, and space travel applications. For the past 28 years, UMS had relied on a EBPG 4 for the production of their transistors. “The Raith EBPG4 was a reliable workhorse for fabrication of our HEMT transistors over the last 28 years. We always needed reproducible results, and the EBPG was the right tool for it - specifically during the ramp-up of the pHEMT technologies linked to the booming telecom market before 2000. The perfect relationship between UMS and RAITH (formerly LEICA / Vistec) that has lasted since the foundation of UMS and, incidentally, the very short delivery time were the reasons to stay together and invest in the EBPG5150. UMS has always perceived Raith as a reliable partner whenever there has been a need for reactive service. With the professional and almost instant support we receive from Raith, I am sure that the new EBPG5150 will soon be up and running and delivering perfect patterns for the next 30 years,” Sahin states.
We are looking forward to continuing the great working relationship we have built up with UMS.