EBPG at leading nanotechnology research institute MESA+
In 2017 Raith won a tender by the University of Twente (Enschede) for the supply of a dedicated and advanced Electron Beam Lithography system. The Raith EBPG5150 system has now been installed and accepted on site at the university’s impressive nanotechnology facility (MESA+NanoLab).
The initial system training has also been finalized, and MESA+ is now ready to offer the extended EBL technology for new and challenging nanolithography activities to the researchers of MESA+, University of Twente, and several start-up companies that are using the MESA+ facilities.
Gerard Roelofs, Head of MESA+ NanoLab, and Ton Jenneboer, Process and EBL equipment engineer, expressed their satisfaction at the smooth system installation and system acceptance and look forward to entering into the next phase of adding high-kV (100kV) Electron Beam Lithography to their services for the research community.
The MESA+ Institute is a leading nanotechnology research institute which focuses on key enabling technologies (KETs) - photonics, fluidics, hard materials, soft materials and devices, combined with responsible research & innovation - and their convergence to realize disruptive innovations in the areas of most societal challenges. The main contributions are in the fields of Health, ICT, and Sustainability.
Over 500 researchers benefit from the MESA+ NanoLab, embracing a cross-disciplinary approach to deliver high-quality and frequently ground-breaking research. MESA+ proactively seeks collaboration with external partners, providing an excellent setting for consortium formation. Next to excellent scientists and facilities, MESA+ offers a strong regional ecosystem that creates a breeding ground where ideas can blossom and grow into relevant, successful solutions and businesses.