Shape the agenda of the upcoming symposium in Austria and win a trip there

After the huge success of our last Symposium in Delft, we are happy to announce the next event, this time to be held near Vienna. The second European Symposium on Direct Write, Optical, Ion, and Electron Beam Lithography will take place at the Institute of Science and Technology (IST) in Austria. It will feature technical experts as well as customers from Heidelberg Instruments, Nanoscribe, micro resist technology, and Raith, who will present the spectrum of latest state-of-the-art direct-write capabilities.

Vota and win

A first draft agenda has already been drawn up, but before finalizing we would like to ask you for your opinions. Your ideas will help us to better cater to the needs of our attendees. Which topics are especially interesting to you?

Don’t miss this opportunity! By entering our short survey, you can help decide the agenda of the Symposium in Vienna – and you’ll also have the chance to win one of two travel and overnight accommodation packages to the event or one of two Amazon vouchers!

Interested in coming along? Sign up for the event here, where you will also find all the details and the draft agenda.

We look forward to receiving your opinions and meeting you in Vienna!

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