Impressive submissions at this year’s micrograph award – congratulations to the winner!
Another year has passed and once again we were amazed by the work you are doing on our systems. As every year, we are happy to announce the winners of this year’s Raith Micrograph Award:
1st place went to Christiaan Bekker from the University of Queensland, Australia. His micrograph, “Broadband-tunable double disk electro-optomechanical system with integrated gold electrodes,” shows a silica double disk microcavity with an integrated electrical element. The optical resonance frequency of the cavity is strongly dependent on the space between the two disks. The integrated electrodes are made of gold, and are used to apply a capacitive force to the spokes proceeding from the central pedestal of the device. Applying a voltage across the electrodes with ultra-sharp tungsten probes (the source of the scratches visible on the pads in the micrograph) causes the arms to be actuated out-of-plane, changing the equilibrium spacing of the double disks. In this way, the optical resonance frequency of this device can be tuned to be resonant with any frequency within the silica transparency window. The smaller anchors are designed to release stress in the annuli and spokes, as discussed in Micrograph. The work was done on a Raith eLINE Plus.
2nd place went to Sedighe Saimian from Laboratorio NEST, Italy. Her micrograph “Buried Split-Gate-Defined Graphene Quantum Point Contacts” shows three sharp split gates or quantum point contacts (QPC) which were patterned by electron beam lithography (EBL) on a 300 nm SiO2 on substrate. The tip architecture was designed to apply sharp electrical fields between the split gates. The gate fingers have a width of 500 nm and relative distance of 100, 200, and 300 nm respectively. The gate structure was then buried under a cross-linked PMMA acting as gate insulator. For this purpose, a 200 µm x 200 µm area of spin coated PMMA centered above the split gates is cross-linked by a high dose of e-beam exposure (15000 µC/cm2), while the rest of the PMMA was dissolved in acetone. Exfoliated graphene was then transferred on top of the PMMA using a micromanipulator, precisely aligned to the split gate structures. Another EBL step, followed by an etching process, was used for shaping the graphene channel into a rectangle. Oxygen plasma etching was performed on the uncovered graphene and on 25 nm of cross-linked PMMA.
And then we have a split 3rd place. Denver Linklater from Swinburne University of Technology, Australia and Xiaoyang Duan, from Heidelberg University, Germany both contributed very interesting micrographs as well. Denver Linklater submitted a picture of his work on biomimetics to reinvent surfaces through nanofabrication methods, whereby the nanostructured topography is directly responsible for bacterial inactivation through physico-mechanical means.
Xiaoyang Duan submitted a micrograph showing a scanning plasmonic color generation scheme, in which sub-wavelength plasmonic pixels can be laterally switched on and off through directional hydrogenation/dehydrogenation of a magnesium screen.
On top of these four winners, we are happy to announce four Art Award winners: Ana Conde-Rubio from the University of Barcelona, Spain; Jordi Llobet from the International Iberian Nanotechnology Laboratory, Portugal; Thomas Loeber from TU Kaiserslautern, Germany; and Daniel Vakulov from Eindhoven University of Technology, Netherlands.
Congratulations again to all the winners! You can check out this year’s Art Award and read previous success stories here.
Your chance to win
Have you also generated some impressive micrographs with a Raith system? Then make sure you enter our micrograph award with the chance to win a trip to a conference of your choice! Registration is open all year round.