Raith EBPG5200 to be installed at National University of Singapore E6NanoFab

Photo of the high resolution lithography system EBPG5200

E6NanoFab is a micro-nanofabrication research center in the department of Electrical and Computer Engineering of National University of Singapore. This shared research facility has 1081 m2 of cleanroom area and is equipped with over 80 items of process equipment. The core capability of the center is to integrate standard semiconductor processes with new process technologies such as 3D printing, heterogeneous integration, and laser micromachining to support a variety of research fields including flexible electronics, spintronics, bioelectronic systems–on-chip, quantum technology, and next-gen AI hardware. E6NanoFab can provide solutions for different types of complex patterning requirements with direct electron beam lithography, fast laser direct writing, micron/sub-micron wafer-level patterning by mask aligner, and nanoimprinting for large areas.

photo of NUS
National University of Singapore

Besides lithography, the center has the capacity to process more than forty different materials. Materials can be deposited via physical vapor deposition, chemical vapor depositions, and thermal and plasma enhanced atomic layer depositions. A dedicated chamber for ultrathin crystalline oxide depositions is in place for tunneling junction fabrications. Epitaxial growth of group II-VI and group IV materials is available via molecular beam epitaxy. In addition, E6NanoFab also provides a suite of tools for reactive and ion beam etching for precision removal of a variety of materials.

Advanced physical characterization support is also enabled in E6Nanofab. The capabilities include microscopy, surface analysis, optical spectroscopy, physical property determination, and chemical analysis including SEM, Raman PL, SPM, SQUID, XRD, TOF-SIMS, EDS etc.

A state-of-the-art Raith EBPG5200 electron beam lithography system will be installed at the E6NanoFab by the end of 2019. The E6NanoFab researchers and users are expected to benefit from the high resolution and high throughput EBL capabilities of the EBPG system for their nanofabrication needs and applications.

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