Raith EBPG5200 to be installed at National University of Singapore E6NanoFab

Photo of the high resolution lithography system EBPG5200

E6NanoFab is a micro-nanofabrication research centre in the department of Electrical and Computer Engineering of National University of Singapore. This shared research facility has 1081 m2 of cleanroom area and it is equipped with over 80 process equipment. The core capability of the center is  to integrate standard semiconductor processes with new  process technologies such as 3D printing, heterogeneous integration, laser micromachining  to support a variety of research fields including Flexible Electronics, Spintronics, Bioelectronic systems–on-Chip, Quantum Technology, & Next-gen AI hardware. E6NanoFab can provide solutions for different type of complex patterning requirements with direct electron beam lithography down to 7nm, fast laser direct writing, micron/sub-micron wafer-level patterning by mask aligner, and nanoimprinting for large-area. 

Besides lithography, the centre has capacity to process more than forty different materials. Materials can be deposited via physical vapour deposition, chemical vapour depositions, thermal and plasma enhanced atomic layer depositions. Dedicated chamber for ultrathin crystalline oxide depositions is established for tunnelling junction fabrications. Epitaxial growth of group II-VI and group IV materials is available via molecular beam epitaxy. In addition, E6NanoFab also provides a suite of tools for reactive and ion beam etch for precision removal of a variety of material.

photo of NUS
National University of Singapore

Advanced physical characterization support are also enabled in E6Nanofab. The capabilities include microscopy, surface analysis, optical spectroscopy, physical property determination, chemical analysis such as: SEM, Raman PL, SPM, SQUID, XRD, TOF-SIMS, EDS etc.

A state-of-the-art Raith EBPG5200 electron beam lithography system is going to be installed at the E6NanoFab by the end of 2019.  It is expected that the E6NanoFab researchers and users would benefit from the high resolution and high throughput EBL capabilities of the EBPG system for their nanofabrication needs and applications.

Over 500 researchers benefit from the MESA+ NanoLab, embracing a cross-disciplinary approach to deliver high-quality and frequently ground-breaking research. MESA+ proactively seeks collaboration with external partners, providing an excellent setting for consortium formation. Next to excellent scientists and facilities, MESA+ offers a strong regional ecosystem that creates a breeding ground where ideas can blossom and grow into relevant, successful solutions and businesses.

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