Join the first Joint Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Everything is a bit different this year – and so is our successful symposium. We are happy to announce the Joint Symposium on Direct Write, Optical, Ion and Electron Beam Lithography will take place online this year on December 3rd from 9:30 am – 4:00 pm CET.

Even though the cirumstances have changed, the concept remains the same. So save your spot now to exchange the latest news and ideas about nanolithography.

Sign up here

As in previous years the symposium features technical experts as well as customers from Nanoscribe, micro resist technology, GenISys, Heidelberg Instruments and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. For example, Prof. Dr. Wolfram Pernice from the WWU Münster will talk about photonic neuromorphic computing, while Nezih Unal from GenISys will explain how electron beam lithography software enables quantum devices. More interesting talks are planned, check out the whole agenda here.

Collage of different application pictures

The popular process clinic after the talks will take place as well. You can get in touch with representatives from each participating company and ask your specific questions to the experts.

Don’t miss the opportunity, to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines. Participation is free for registered participants, so sign up now!

All information and the registration can be found here:
Should you have any further questions, please don’t hesitate to get in touch with Christina Wagner,

We look forward to meeting you online!

Logos of the companies of the Online Symposium 2020