Select first-choice evolutionary technology

Photo of the high resolution lithography system EBPG Plus

High-resolution lithography with automation, throughput, and reliability

The EBPG Plus is an ultra-high-performance electron beam lithography system. This field-proven and highly successful series has now reached a further evolutionary level. With 100 kV write mode and high-resolution lithography below 5 nm, it covers a wide range of leading-edge applications for direct-write nanolithography, industrial R&D, and batch production in every kind of nanofabrication facility. The new integrated harmonization of throughput, stability, fidelity, and precision ensures perfect interaction between all performance parameters for optimum high-resolution lithography results. Features such as

  • automated wafer and multi-sample exposures
  • automated exposure parameter switching and calibration, allowing seamless and stable switching between high throughput and high resolution
  • easy-to-learn graphical user interface and terminal interface for scripting
  • secure multi-user environment and different access levels
  • extremely fast stage with very low settling times
  • automated 2- or 10-holder airlock,
  • fast and error-free sample alignment
  • advanced fracturing modes for lowest line-edge roughness
  • highly efficient data processing using Firebird technology for highest pattern fidelity in the shortest time
A holder with four 3 inch wafer is one of the possibilities to use in the 10-holder airlock

make the EBPG Plus an extremely versatile electron beam lithography system that is the first choice for industrial and academic use.

Shaping the future of nanofabrication

EBPG Plus offers a unique combination of automation, modularity, and performance. An intuitive user interface plus automated workflow with optional data preprocessing software helps the user to focus on achieving results instead of system handling. With many different holders available, EPBG Plus delivers uncompromised automation without restrictions for wafer or sample geometry. Furthermore, the high-resolution lithography system can be field-upgraded at any time in step with changing demands.

Evolutionary technology

As the market leader for professional electron beam lithography systems, we supply systems that are continuously honed and improved at the leading edge of nanotechnology. This gives us the experience needed to confidently meet the demanding requirements of industrial clients with guaranteed stability and uptime. The EBPG Plus allows 24/7 batch mode operation with minimal operator input for consistent high output and yield.

Questions?

If you have any questions or need more information, just get in touch!

Features

Direct write performance with overlay accuracy

≤ 5 nm

Stable large-area writing with stitching accuracy

≤ 8 nm

Beam current up to

350 nA

Choose the right system for your specific nanolithography requirements

The EBPG Plus is a high-throughput, high-resolution lithography system. To meet the varying requirements of every customer, the EBPG Plus comes in two versions, each adaptable. The EBPG5200 Plus has full 200-mm writing capability with ultimate stability, while the EBPG5150 Plus utilizes the same universal plinth platform with a 150 mm stage suitable for all R&D and compound semiconductor manufacturing applications. To find out which configuration best suits your needs, get in touch with us.

Productlogo EBPG5200 Plus
Photo of the high resolution lithography system EBPG Plus
Productlogo EBPG5150 Plus
Picture of the high resolution lithogrpahy system EBPG5150 Plus
Contact us
Photo of three people working in the Raith Service and Support Center

Raith Service - with you all the way

There is no doubt that specifications and system performance parameters are drivers of decisions for EBPG; however, more factors need to be taken into consideration to ensure efficient operation, continuous uptime, and subsequent solid support over the instrument system’s lifetime.

With a worldwide team of professional service engineers, Raith Service ensures you can make the best use of your system. All site surveys with environmental measurements, support with resulting cleanroom laboratory setup, factory and on-site acceptances, and comprehensive on-site training are always included when you decide on a Raith system. Moreover, application support is available free of charge in all global time zones.

Raith service contracts are set up in a modular scheme and can be configured to match your individual requirements and budget. Visit our Service site or get in touch with us to learn more.

Service

Download EBPG Plus brochure