Focused Ion Beam Nanofabrication
Photo of the focused ion beam lithography system ionLINE Plus
FIB Nanofabrication at Its Excellence
High Resolution and Versatile Focused Ion Beam Nanofabrication, Lithography and Nanoengineering
Photo load loack of the focused ion beam system ionLINE Plus
The focused ion beam system ionLINE Plus can accept and precisly navigate on samples up to 100 mm in size

FIB meets LITHO

High resolution nanofabrication employing advanced FIB techniques with lithography instrumentation

The ionLINE Plus breaks new ground for your nanofabrication challenges by realizing the synergy of a focused ion beam and a mature lithography architecture. It combines various direct FIB processing techniques with unrivaled stability, automation, reproducibility, and high resolution of a lithography instrument.

FIB techniques can make nanofabrication more efficient by employing direct patterning (milling, deposition, etching) or hard masking and introduce new processes based upon maskless ion implantation or surface functionalization. ionLINE Plus has been developed in response to the rapidly growing interest in ion beam based nanofabrication in various areas of research and development. Its unique nanoFIB Three ion column delivers high resolution, excellent placement accuracy, long-term stability and record low beam tails.

Focused Ion Beam benefits

  1. True 3D direct patterning, also on topographic samples
  2. Simplified processes and process development for fastest time to results
  3. Versatile FIB techniques for challenging or new materials

Advanced FIB Nanofabrication

  1. Guaranteed sub-10 nm FIB nanofabrication and excellent beam spot characteristics
  2. Lithography-class stability and accuracy over extended areas and periods of time
  3. Multiple ion species beyond gallium (IONselect technology)
  4. Laser interferometer stage for highest precision and true field stitching or continuous patterning

Advanced chamber for evolutionary FIB system

Illustration of chamber set-up of the focused ion beam system ionLINE Plus

The new chamber design of the ionLINE Plus supports a configurable setup that is ready for future upgrade paths. Among other features, the focused ion beam system can be equipped with various multi-line and mono-line gas injection systems. Inclusion of multiple GISs from different opposite directions allows for gas-induced processes such as X-section analysis and wiring of nanoobjects. Gas-assisted etching offers increased removal rates, better selectivity and less redeposition.

A further new feature is a nanoprofilometer as an add-on option, which enables 3D process control as well as lateral secondary electron imaging information. The 3D surface imaging solution nanoSense helps to qualify deposition, etching, and milling processes in situ within minutes. Further options include cartesian nano-manipulators, various optical cameras, chamber de-contaminator, sample auto height sensing, and more.

IONselect technology - FIB nanofabrication beyond gallium

Photo of nanoFIB Three ion column of FIB system
Raith’s nanoFIB Three ion column truly defines a new state of the art in FIB technology

The nanoFIB Three technology is used for the stable delivery of gold, silicon, or other ions with nanometer beam diameters. The flow optimized alloy ion source and low aberration ion optics enable easy switching between multiple ion species from a single source, while preserving the high resolution and stability of the nanoFIB Three column.

Learn more about IONselect >>

IONselect offers a range of species from doubly charged light ions to heavy ions and clusters, all with excellent handling, enabling different yet-to-be-explored nanofabrication techniques. Processing with low contamination, specific functionalization, higher resolution or surface sensitive milling will pave the way for new breakthroughs in next-generation research.

TwinLITH – combining the strengths of FIB and EBL

The perfect solution for next-generation nanofabrication is offered when a Raith electron beam lithography tool is combined with a Raith focused ion beam system. As the Raith systems share a hardware and software platform, perfect synergy of 2-dimensional EBL resist accelerated lithography and 3-dimensional direct FIB patterning can be achieved. The shared lithography architecture makes it easy to exchange sample holders, GDSII designs, and job lists, and therefore permits advanced and efficient nanofabrication. These two separate and complementary systems allow supplementary nanofabrication tasks to be worked on in parallel without losing time or compromising the full benefit of either nanofabrication technique. Write with two hands simultaneously, and make the most of each tool’s strengths for patterning, process development, and control. Get in touch with us to discuss the possibilities.

ionLINE Plus Product Details

Main Application:
  • Direct and 3D nanofabrication
  • Nanolithography
  • Deposition and Gas Assisted Etching (GAE)
  • Nanoengineering platform
  • Ga-free nanofabrication

Stage:
  • 4“ full travel
  • Large Z travel
  • Rotation and Tilt

 

 
Column Technology:
  • nanoFIB
  • Ions: Ga, (Au, Si)
  • 35 kV
  • IONselect

 


Unique Writing Mode:
  • traxx
  • periodixx

 

ionLINE Plus Downloads

  1. ionLINE Plus Product Brochure(PDF)
  2. Raith Nanofabrication and SEM Instrument Technologies Brochure(PDF)
  3. Application Note Ion Beam Lithography for Fresnel Zone Plate Fabrication in Gold on Membranes(PDF)
  4. Application Note traxx(PDF)
  5. Application Note periodixx(PDF)
  6. Product Portfolio Brochure

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