High resolution FIB Nanofabrication beyond Gallium
Raith’s proprietary FIB technology has evolved to enable advanced nanofabrication and truly defines a new state of the art in FIB. The nanoFIB Three can even be extended for the stable delivery of gold, silicon, or other ions with nanometer beam diameters. This unique IONselect upgrade path comes with a multi-species ion source and low aberration ion selection optics. This liquid metal alloy ion source (LMAIS) replaces the Ga LMIS and is based on a special flow-optimized tip geometry for the eutectic alloy material, ensuring long-term stability and improved lifetime. With automated ramp-up and emission control, it can be run as for standard FIB operation and used as a novel tool for nanofabrication. Since the alloy ion source provides simultaneous emission of various ions, easy switching between multiple species from a single source becomes possible, while preserving the high resolution of the nanoFIB Three ion column.
Offering a range of species
IONselect offers a range of species from doubly charged light ions to heavy ions or clusters, all with excellent handling. The ion species define the nature of the interaction mechanism with the sample and thus have significant consequences on the resulting nanostructures. This allows for unique yet-to-be explored nanofabrication techniques with low contamination, higher resolution or increased surface sensitivity. Examples are using a silicon ion beam for patterning of thin layers with less contamination and higher resolution or employing gold ions or clusters for specific functionalization. This technology is applied to an increasing number of challenges in nanofabrication and imaging and will pave the way for new breakthroughs in next-generation research.