Advanced Lithography Training

Raith offers different workshops for those users and operators who have already gained some wider experience with Raith systems.

Workshops

Choose from our range of workshops.

Electron Beam Lithography Workshop I: Proximity effect and correction

Concept

The purpose of this workshop is to establish a deeper understanding of the proximity effect (PE) in electron beam lithography.

The physical background of the effect is explained briefly, as well as methods to avoid the influence of the PE. Another focus is the usage of Raith software package for proximity effect correction.

After the workshop the participants should be able to estimate the impact of the PE to their application and know either how to circumvent the effect or how to correct the dose distribution of their pattern.


Location

  • General explanation of proximity effect in electron beam lithography (talk)
  • Introduction to Raith proximity effect correction software (talk & off-line session)
  • Correction of participants’ GDSII designs (off-line session)
  • Exposure of the participants` patterns and investigation of the results (practical session)
  • Determination of proximity effect parameters (talk & practical session)

Location

Raith headquarter in Dortmund, Germany


Appointment

April 20th – 21st, 2021

Fee

1,190.00 Euro total (incl. 19% VAT)
Cancellation policy: less than four calendar weeks prior to course 50% refund, less than one calendar week prior to course no refund.

Contact Person

Dr. Guido Piaszenski

Phone: +49 (0)231 / 95004 – 114

Email: guido.piaszenski@raith.de


Raith Workshop I

Please register now

Peronal data

Electron Beam Lithography Workshop I: Proximity effect and correction

Billing address:

Billing

Accomodation*:

Please arrange a hotel for me (single room, Dortmund City) *

My systems / equipment of interest:

My systems / equipment of interest:
If you are interested in a workshop with practical exposure training on one of our EBPG systems, please contact us, using the contact form or send an email to contact@raith.de.

My software:


Experience Level:


Applications:

I will bring my own ...

In order to encourage the exchange between the participants an introduction of yourself and your research and applications is highly appreciated during the first session. If you prefer to show a presentation, please restrict yourself to approx. 3 slides or 5 minutes.
Privacy *

Electron Beam Lithography Workshop II: Automation and wafer exposure

Concept

This workshop should enable the user to fully tap the automation potential of the Raith software suite. Additionally the user will learn how to handle wafers with the RAITH150 Two and eLINE Plus series of tools.

The automation session of the workshop explains to the user how to hook into the program flow of the Raith software. It enables the user to extend and expand functionality as well as to automate common tasks. Since a crash course of JavaScript is part of the workshop, no prior knowledge of a programming language is required to attend this workshop.

In the wafer handling session of this workshop, the user learns how to handle wafers with the Raith tools. This is done in a manual step by step fashion. The theoretical part deals with creation of wafer maps and in depth discussion on how to use project files to save settings. The practical part transfers this knowledge to the machine and trains adjustments and navigation on wafers.

For automatic wafer handling a separate purchase and on-site training is neccessary.


Location

Raith headquarter in Dortmund, Germany


Appointment

April 22nd – 23rd, 2021

Fee

1,190.00 Euro total (incl. 19% VAT)

Contact Person

Dr. Guido Piaszenski

Phone: +49 (0)231 / 95004 – 114

Email: guido.piaszenski@raith.de


Raith Workshop II

Please register now

Peronal data

Electron Beam Lithography Workshop II: Automation and wafer exposure

Billing address:

Billing *

Accomodation*:

Please arrange a hotel for me (single room, Dortmund City) *

My systems / equipment of interest:

My systems / equipment of interest:
If you are interested in a workshop with practical exposure training on one of our EBPG systems, please contact us, using the contact form or send an email to contact@raith.de.

My software:


Experience Level:


Applications:

I will bring my own ...

In order to encourage the exchange between the participants an introduction of yourself and your research and applications is highly appreciated during the first session. If you prefer to show a presentation, please restrict yourself to approx. 3 slides or 5 minutes.

Privacy *

Focused Ion Beam Nanofabrication Workshop III: FIB advanced applications

Concept

The purpose of this workshop is to receive background information on the special characteristics of a focused ion beam as well as to learn about the range of FIB nanofabrication.

Both the spot characteristics and the interaction mechanism with the sample are significantly different for an ion beam compared to an electron beam, so that a short introduction to the physical background will be given. Moreover the ion beam provides a full range of universal techniques at different stages of the nanofabrication process: resist exposure for a conventional lithography approach, hard masking (milling or implantation) for saving the resist related steps or even direct milling of the functional layer. This requires specific knowledge of the according techniques and optimized patterning parameters.

In general, IBL offers complementary advantages in terms of direct and 3-dimensional nanofabrication, which may also help to reduce the total number of steps in the overall process. Therefore benefits of combining EBL and IBL by using dedicated lithography tools will also be discussed.


Topics

  • Specials of ion generation and beam spot characteristics
  • Interaction mechanism with sample, imaging and sputter yield
  • How to deal with interaction for optimization of process parameter
  • Range of available patterning techniques
  • Advanced IBL Nanofabrication
  • Patterning on Image and advanced lithography approach
  • Long-term, high resolution processing with automation
  • Special approaches for membranes or 3D samples
  • Outlook on advantages of new ion species beyond Gallium

Location

Raith head office in Dortmund, Germany


Appointment

Workshops are offered upon request. Please get in touch with us to find a suitable date.

Fee

1,190.00 Euro total (incl. 19% VAT)

Contact Person

Achim Nadzeyka

Phone: +49 (0)231 / 95004 – 227

Email: achim.nadzeyka@raith.de

Contact us

Electron Beam Lithography Workshop IV: Nanoengineering options

Concept

The workshop gives users a general physical background of process technology and enables the user to gain first hand experience of the Raith nanoengineering options.

The workshop includes training seminars, as well as off-line and several practical sessions. It introduces the user into the hardware setup needed for nanoengineering options, such as the gas injection system, nano manipulators and EDX. Moreover useful start parameters and methods for process optimization are discussed.

A presentation introduces the user to the Raith software modules of the nanoengineering options.

The Raith nanoengineering workstation is demonstrated with a practical session on EBID, nano manipulation and EDX. The off-line session provides the user the opportunity to become acquainted with the Raith software and to ask specific, parameter and application related questions. Working on a PC with the Raith software in two succeeding practical sessions, the user can apply the knowledge learned and gain first hands on experience with the Raith nanoengineering options.

In order to encourage the knowledge exchange within the workshop every participant is requested to introduce his field of research and their application during the first session and restrict his presentation to approximately three slides or five minutes.


Location

Raith head office in Dortmund, Germany


Appointment

Workshops are offered upon request. Please get in touch with us to find a suitable date.

Fee

1,190.00 Euro total (incl. 19% VAT)

Contact Person

Axel Rudzinski

Phone: +49 (0)231 / 95004 – 115

Email: axel.rudzinski@raith.de

Contact us

Your cancellation guarantee for trainings and workshops

Substitute participant

Rebooking in favor of a substitute participant is possible anytime free of charge.

Rebooking

You can move your booking to another date or change it to a different course/workshop. Please notify us thereof in writing. A handwritten signature is not required. We charge the following processing fees:for rebookings (only possible once):

Rebooking up to 3 weeks before the start of the event: free of charge

Rebooking 3 - 1 weeks before the start of the event: 10% of course/workshop fee, plus VAT.

Rebooking from 1 week before the start of the event: 20% of course/workshop fee, plus VAT.

Cancellation

You may withdraw from the contract anytime. However, you must to do so in writing. A handwritten signature is not required. Please note that we charge the following processing fees for cancellations:

Cancellation up to 3 weeks before the start of the event: free of charge

Cancellation 3 - 1 weeks before the start of the event: 20% of course/workshop fee, plus VAT.

Cancellation from 1 week before the start of the event: the full course/workshop fee, plus VAT.

The full amount, plus VAT, is also charged in the event that a registered participant.does not show up for the course/workshop.