Sample Automation - Multiple Wafer/Batch Operation

Nanolithography is done on (multiple) small samples, but also on standard wafer sizes. Some industrial mix and match direct write application require batch operation of several wafers, exposed one after the other – completely unattended. The Raith portfolio covers the full range of automation requirements. For mask fabrication in open loop lithography mode, full automation is offered at the required highest grade instrument stability.

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