“Our institute is focused on research in the field of ultrafast nanooptics. High quality and reproducible EBL is essential for the fabrication of nanopatterns for plasmonic structures and metamaterials extending over areas up to several square centimeters. The eLINE Plus is a universal tool that, besides being essential for high-resolution e-beam lithography, offers stitch-free patterning and sample imaging of highest quality.

Our ionLINE Plus FIB system (now VELION) makes processes possible that we have never thought of before: 3D fabrication on thin membranes, template making, and Ga-contamination-free milling. It is an essential system for further expanding our range of applications. With the use of ion species other than Ga and conditions of highest stability, making milling over several days possible, the ionLINE Plus has become a crucial system in our clean room.

All Raith systems are quite easy to use, providing an intuitive graphical user interface.
Raith tools provide breakthrough technology at a very high level of reliability and reproducibility. This makes them real “paper machines” for our group. In the last year alone we published more than ten papers which would never have been possible without these systems.

We have been Raith customers for many years and particularly appreciate the excellent support and service, which never takes more than a few hours to respond and help out with urgent questions.”