Dedicated Electron Beam Lithography
Photo of the ultra high performance electron beam lithography system EBPG5200
Select first-choice evolutionary technology
Ultra high performance Electron Beam Lithography
  • Home
  • Products
  • High resolution lithography: EBL tool EBPG5200
Photo of a wafer being pulled from an EBPG5200 for high resolution lithography
An 8 inch wafer is one of the possibilities to use in the 10-holder airlock

High resolution lithography with automation and throughput

Shaping the future of Nanoscience

The EBPG5200 is a high performance nanolithography system with full 200 mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series. It offers a wide range of leading edge solutions for both direct write nanolithography and R&D mask making in universities and commercial centers of excellence.

The system is available alongside the EBPG5150 which utilises the same universal plinth platform based on a 155 –mm by 155-mm stage platform.

Improved Specifications

  • Ultra-fast, low-noise pattern generator 125 MHz
  • Extreme beam current up to 350 nA
  • Excellent direct write performance with overlay accuracy of ≤ 5nm


  1. Highest resolution
  2. Unparalleled automatic calibration and job execution
  3. High current density Thermal Field Emission gun for operation at 20, 
50 and 100 kV
  4. 200 mm platform for up to 8 inch wafer and 7 inch masks
  5. Minimum feature size of less than 8 nm
  6. Continuously variable large field size operation to 1 mm at all kVs
  7. GUI for ease of use operation for diverse "multi user environment"
  8. Flexible configuration packages to ensure best fit with application requirements

Modular system archtitecture

The modular system architecture allows the adaptation of the system configuration to specific customer requirements along with a structured upgrade strategy enabling a path for tracking future technology trends as well as protecting the customer's initial system investment.

EBPG5200 Product Details

Main Application:
  • High KV for high aspect ratio nanostructures
  • High speed Direct Write
  • Batch production e.g. compound
    semiconductor devices
  • Anticounterfeiting security elements
Column Technology:
  • EBPG
  • Electron
  • 100 kV

  • 8“ full travel
  • Large (vertical) Z travel option
  • 10x autoloader


EBPG5200 Downloads

  1. EBPG Series Systems Product Brochure(PDF)
  2. Product Portfolio Brochure

Back to Overview

Login as registered user: