Dedicated Electron Beam Lithography
Photo of the high-performance e-beam writer VOYAGER
Speed up! Fast, smart, innovative and economical
High performance Electron Beam Lithography
Loadlock of lithography system VOYAGER
With it’s innovative architecture VOYAGER allows for a cost-effective "through-the-wall-loading” setup of the e-beam writer

A new class of EBL technology

Accurate results, delivered at high speeds and reasonable costs

VOYAGERTM is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.

As well as the newly developed, innovative eWRITE system architecture, Raith attaches great importance to an attractive price/performance ratio throughout the lifetime of the system.

The hardware and software has been consistently designed for automated exposure operations. The state-of-the-art high- performance pattern generator and the electron optics have been optimally aligned.

Samples of up to 8 inches are exposed at high speed. The necessary system stability is ensured, even in difficult environments, by a thermally stabilized and environmentally tolerant housing.

Ultra high resolution lithography system

  1. Reliable speed from first design to finished sample
  2. Smart design: enclosed environment and small system footprint
  3. Innovative and future safe system architecture
  4. Excellent cost of ownership for dedicated Electron Beam Lithography writing with a speed of more than 1 cm²/h

eWrite technology

Raith´s new eWrite technology combines dedicated Electron Beam Lithography optics with an innovative pattern generator design. This technology is suitable for all jobs in research and development as well as for batch production.

 

VOYAGER Applications

  • SEM image showing Sub-7 nm ultra high resolution lines in HSQ.jpg
    Sub-7 nm lines in HSQ Raith GmbH, Dortmund
  • EBL written center of a fresnel lense.jpg
    Center of a 1x1 cm² fresnel lense in SU-8 written in 53 minutes Raith GmbH, Dortmund
  • SEM image of 150 nm gate fabricated by electron beam lithography.jpg
    150 nm gate in PMMA (bi-layer) Raith GmbH, Dortmund
  • Application picture of large area dense grating.jpg
    1x1 cm² grating in ZEP520a in less than 2 hours Raith GmbH Dortmund
  • Image showing Microcontacts to Nanofeatures.jpg
    Automatic switch between high throughput and high resolution mode (160µm at 40 nA and 10 nm at 0.4 nA) Raith GmbH, Dortmund, Germany
  • Photonic crystal waveguide patterned by the lithography system VOYAGER.jpg
    Photonic crystal waveguide in ZEP520a Thomas Krauss, University of York, UK

VOYAGER Product Details

Main Application:
  • High speed direct write
  • Diffractive optical elements
  • Anticounterfeiting security elements
  • Batch compound semiconductor devices manufacturing
Stage:
  • 6“ full travel - 8“ wafer handling
    (4" option available)
  • Large Z travel
  
Column Technology:
  • eWrite
  • Electron
  • 50 kV

 

 

Unique Writing Mode:
  • traxx
  • periodixx

 

 

VOYAGER Downloads

  1. VOYAGER Product Brochure(PDF)
  2. Product Portfolio Brochure

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