Learn how a standard adhesive tape can help overcome the relatively slow patterning speed of direct FIB milling. Our new application note describes the sketch & peel approach in detail and also investigates the change in outcome when using different ion species. Download it here:
Nanofabrication at its best –
Broadest portfolio of nanoinstruments available
As a world leading manufacturer of nanofabrication instrumentation, Raith helps customers in achieving great results in their field of work. Offering over 35 years of experience and an international service and support structure, Raith supplies the best solutions for nanofabrication, electron beam lithography, FIB-SEM nanofabrication, nanoengineering, IC reverse engineering and life sciences applications. Be at the top of the game in your area of expertise, with the best Raith solution for realizing your application.
Contact us or get to know more about the Raith company, and you’ll be convinced we are the best partner for anybody working in the nanofabrication world.
So much more than Electron Beam Lithography
Raith offers the widest range of nanofabrication solutions available on the market. The company’s unique portfolio of products and services span upgrades for existing microscopy systems, various types of turnkey systems in electron beam lithography, and solutions for FIB-SEM nanofabrication and reverse engineering.
Whatever the requirements of the nanofabrication challenge you are facing, our portfolio offers the ideal solution.
The areas of applications and fields that use Raith systems could hardly be more diverse; from fundamental research in nanophysics and nanomedicine, optoelectronics and material science to quantum technology, the possibilities are endless. Here are a few examples to give you an idea of what our customers are achieving with Raith system technology.
Congratulations to this year's winner of the Raith Micrograph Award: Christiaan Bekker (University of Queensland, Australia), Sedighe Salimian (NEST, Italy), Denver Linklater (Swinburne University of Technology, Australia) and Xiaoyang Duan (Heidelberg University, Germany). Find out who won an art award and take a closer look at the winner micrographs here
Congratulations to our customer Prof. Andrei Faraon from Caltech for his achievements in MEMS-integrated metasurfaces!
Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.
Congratulation to our customers at Karlsruhe Institute of Technology (KIT) who received the Gips-Schüle Research Award for the World’s Smallest Photodetector!
Sascha Mühlbrandt, Christian Koos, and Manfred Kohl of KIT’s Institute of Microtechnology/Institute of Photonics and Quantum Electronics were honored for their work on plasmonic photodetectors which combine an ultra-compact footprint with electro-optical bandwidths of hundreds of GHz.
More detailed information can be found in the paper "Silicon-plasmonic internal-photoemission detector for 40 Gbit/s data reception" which was published in Optica: https://doi.org/10.1364/OPTICA.3.000741
With the EBPG5200 at IMT the record-breaking ultracompact devices can be fabricated within a week. Nowadays their architecture can even be expanded from three to four layers which is only possible due to the high overlay accuracy of the patterning system. We are excited for our customers and eager to see where the research will lead in the future.
Time lapse video
DFB laser grating writing newly defined
The easiest nanolithography software user interface now available
Raith's new Multi Sample exposure package simplifies and consolidates exposures of multiple samples from different users and user levels in a single run. It offers easy access to nanolithography for users with or without experience in electron beam lithography and is a big step towards a nano-printer.
ionLiNE Plus proofs unique capabilities
A research group headed by Prof. Weibo Gao at Nanyang Technological University in Singapore, in cooperation with the Raith application team, has recently shown that ion implantation with a focused Si++ ion beam can be employed for creating active silicon vacancies in SiC.
New partnership strengthens global sales activities for unique ZEISS ORION NanoFab platform
Watch the video showing the use of the VOYAGER at the University of Iowa
Read about exciting research, impressive results or technical details in our Download section. We have provided a selection of application notes, product brochures, newsletters, and more to provide you even deeper insights into the nanofabrication world. Browse our Download section and download the PDFs.