Application picture of 3D microfluidic channel using FIB lithography

Cutting Edge Research and Industry Solutions for Electron Beam Lithography, FIB Nanofabrication, Nanoengineering and Reverse Engineering.

The perfect EBL SEM hybrid system PIONEER Two with link to PIONEER Two product site

Combining state-of-the-art nanolithography and analytical SEM-imaging in a single tool

With its range of solutions, Raith operates in all areas where nanostructures are deployed as indispensable components of products and technologies.

Lithography application picture of honeycomb structure without stitching errors through periodixx

Lithography options (traxx and periodixx) have been developed for the purpose of carrying out nanolithographic exposures without stitching errors that are normally present.

Picture of differen nanofabrication applications

Nanofabrication at its best –
Broadest portfolio of nanoinstruments available

As a world leading manufacturer of nanofabrication instrumentation, Raith helps customers in achieving great results in their field of work. Offering over 35 years of experience and an international service and support structure, Raith supplies the best solutions for nanofabrication, electron beam lithography, FIB-SEM nanofabrication, nanoengineering, IC reverse engineering  and life sciences applications. Be at the top of the game in your area of expertise, with the best Raith solution for realizing your application.

Contact us or get to know more about the Raith company, and you’ll be convinced we are the best partner for anybody working in the nanofabrication world.

Get to know more about Raith company

Solutions
Graphic of the nanofabrication portfolio

So much more than Electron Beam Lithography

Raith offers the widest range of nanofabrication solutions available on the market. The company’s unique portfolio of products and services span upgrades for existing microscopy systems, various types of turnkey systems in electron beam lithography, and solutions for FIB-SEM nanofabrication and reverse engineering.

Whatever the requirements of the nanofabrication challenge you are facing, our portfolio offers the ideal solution.

Find out more about our solutions for nanolithography, nanofabrication and reverse engineering.

Applications

The areas of applications and fields that use Raith systems could hardly be more diverse; from fundamental research in nanophysics and nanomedicine, optoelectronics and material science to quantum technology, the possibilities are endless. Here are a few examples to give you an idea of what our customers are achieving with Raith system technology.

Check out some examples of nanotechnology applications - and be inspired!

News

Raith's User Events on the EIPBN

Sign up for Raith User Dinner and Raith Users Technical Session

Meet us on the EIPBN in Puerto Rico and interact with like-minded professionals during our Users Dinner and the Raith Users Technical Session. Sign up for both events here

MEMS-tunable dielectic metasurface lens - new publication in Nature Communications

Congratulations to our customer Prof. Andrei Faraon from Caltech for his achievements in MEMS-integrated metasurfaces!

A recently published article in Nature Communications demonstrates the work of his group which paves the way towards MEMS-integrated metasurfaces as a platform for tunable and reconfigurable optics.

New possibilities for nanopatterning: Application Note on Organic Ice Resist

Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.

Read how the newly discovered method opens new possibilities for nanopatterning here:

Micrograph Award winner success story

Paul Kim from the University of Alberta, Canada, our recent Micrograph Award winner redeemed his prize and took a trip to the École de physique des Houches in France. Read the whole success story here:

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Join us for a symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the TU Delft on May 16th.

The symposium features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.

Don't miss the opportunity to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines and sign up now

5 reasons why Raith EBL systems offer the best solution for fast and easy DFB laser fabrication

The need for DFB laser is continuously increasing and with it the need to create precise gratings fast and easy. Find out the 5 reasons why Raith's EBL tools are proven as the best way to tackle the challenges given by DFB laser makers here:

New FIB-SEM for FIB-centric nanofabrication

We are proud to present VELION, the new FIB-SEM for FIB-centric nanofabrication. With its unique set-up of a vertical FIB-column it allows for versatile use in four different operation modes.  Find out all about the FIB-SEM where FIB truly comes first

Gips-Schüle Research Award for Ultracompact Photodetector

Congratulation to our customers at Karlsruhe Institute of Technology (KIT) who received the Gips-Schüle Research Award for the World’s Smallest Photodetector!

Sascha Mühlbrandt, Christian Koos, and Manfred Kohl of KIT’s Institute of Microtechnology/Institute of Photonics and Quantum Electronics were honored for their work on plasmonic photodetectors which combine an ultra-compact footprint with electro-optical bandwidths of hundreds of GHz.

More detailed information can be found in the paper "Silicon-plasmonic internal-photoemission detector for 40  Gbit/s data reception" which was published in Optica: https://doi.org/10.1364/OPTICA.3.000741

With the EBPG5200 at IMT the record-breaking ultracompact devices can be fabricated within a week. Nowadays their architecture can even be expanded from three to four layers which is only possible due to the high overlay accuracy of the patterning system. We are excited for our customers and eager to see where the research will lead in the future.

Press Releas KIT

 

Winner announcement Raith Micrograph Award 2017

Congratulations to this year's winner of the Raith Micrograph Award: Paul H. Kim, Sasa Gazibegovic and Maurangelo Petruzella. Find out who won an art award and take a closer look at the winner micrographs here

VOAYAGER installation in one minute

Time lapse video

The University of Bristol now has a Raith VOYAGER and you can watch it being installed in one minute!

Scientific poster now available as download

Raith employees continuously contribute to the scientific program of various exhibitions with posters on different topics.
With our new download section, we make the latest ones available to you! Check it out here

Raith splits the atom

DFB laser grating writing newly defined

Find out how gratings with sub-0.1 nm pitch fidelity were achieved:

Webinar Perfecting Large Area, High Resolution SEM Imaging with 3D-Stitching

Have you already watched our webinar "Perfecting Large Area, High Resolution SEM Imaging with 3D-Stitching"? It's available on demand here:

C2N-CNRS-UPSud and Raith continue cooperation over advanced FIB nanofabrication technologies

Marcoussis / Dortmund September, 2017 - Raith and C2N-CNRS-UPSud have entered into a new research cooperation agreement over exploration of advanced technologies for far sub-10 nm nanopatterning, as required for newest generation electronic, magnetic, photonic, and plasmonic nanostructures.

Raith Instrument Technologies

Did you know that Raith Instruments also enable Automated Large Area SEM Image Acquisition, Automated CD SEM Metrology, Linewidth and Placement Measurements as well as Electrical Probing and FIB nanofabriaction?

Find out all about it here

Symposium at Stanford University on direct-write applications - a huge success

Raith and Heidelberg Instruments recently organized a symposium on direct write, optical, ion and electron beam lithography in close collaboration with their joint customer Stanford Nanofabrication Facility (SNF). 

Read all about it here:

New CHIPSCANNER brochure available

Download it now!

Learn everything you need to know about the large-area 3D SEM imaging solution CHIPSCANNER in the updated and extended new CHIPSCANNER Series System Product Brochure or here.

Download it here

New Multi Sample Exposure Package

The easiest nanolithography software user interface now available

Raith's new Multi Sample exposure package simplifies and consolidates exposures of multiple samples from different users and user levels in a single run. It offers easy access to nanolithography for users with or without experience in electron beam lithography and is a big step towards a nano-printer.

Find out how your nanolithography job can now get done easier and faster than ever before

New publication on quantum technology

ionLiNE Plus proofs unique capabilities

A research group headed by Prof. Weibo Gao at Nanyang Technological University in Singapore, in cooperation with the Raith application team, has recently shown that ion implantation with a focused Si++ ion beam can be employed for creating active silicon vacancies in SiC.

Read more about how the ionLINE Plus permitted the scalable fabrication with a dose control down to a few ions per spot.

New Newsletter available now!

Get the latest news on Raith products, applications and the Raith team!

ZEISS and Raith join forces for Helium Ion Microscopy and Nanofabrication

New partnership strengthens global sales activities for unique ZEISS ORION NanoFab platform

The Microscopy business group of ZEISS and the Raith Group agreed to unite their sales and promotional activities for ZEISS ORION NanoFab, the only helium-ion-microscope in the world. ORION NanoFab fabricates sub-10 nm structures and images at 0.5 nm.

Iowa students use microfabrication to improve future

Watch the video showing the use of the VOYAGER at the University of Iowa

CBS 2 covers a story about the University of Iowa using a Raith VOYAGER to improve the future with microfabrication

VOYAGING beyond space using microfabrication

Read the article in which the University of Iowa explains how it uses its electron beam lithography system VOYAGER

Downloads
Picture of a nanofabrication system brochure

Read about exciting research, impressive results or technical details in our Download section. We have provided a selection of application notes, product brochures, newsletters, and more to provide you even deeper insights into the nanofabrication world. Browse our Download section and download the PDFs.

Visit Download section

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