Application picture of 3D microfluidic channel using FIB lithography

Cutting Edge Research and Industry Solutions for Electron Beam Lithography, FIB Nanofabrication, Nanoengineering and Reverse Engineering.

The perfect EBL SEM hybrid system PIONEER Two with link to PIONEER Two product site

Combining state-of-the-art nanolithography and analytical SEM-imaging in a single tool

With its range of solutions, Raith operates in all areas where nanostructures are deployed as indispensable components of products and technologies.

Lithography application picture of honeycomb structure without stitching errors through periodixx

Lithography options (traxx and periodixx) have been developed for the purpose of carrying out nanolithographic exposures without stitching errors that are normally present.

Picture of differen nanofabrication applications

Nanofabrication at its best –
Broadest portfolio of nanoinstruments available

As a world leading manufacturer of nanofabrication instrumentation, Raith helps customers in achieving great results in their field of work. Offering over 35 years of experience and an international service and support structure, Raith supplies the best solutions for nanofabrication, electron beam lithography, FIB-SEM nanofabrication, nanoengineering, IC reverse engineering  and life sciences applications. Be at the top of the game in your area of expertise, with the best Raith solution for realizing your application.

Contact us or get to know more about the Raith company, and you’ll be convinced we are the best partner for anybody working in the nanofabrication world.

Get to know more about Raith company

Graphic of the nanofabrication portfolio

So much more than Electron Beam Lithography

Raith offers the widest range of nanofabrication solutions available on the market. The company’s unique portfolio of products and services span upgrades for existing microscopy systems, various types of turnkey systems in electron beam lithography, and solutions for FIB-SEM nanofabrication and reverse engineering.

Whatever the requirements of the nanofabrication challenge you are facing, our portfolio offers the ideal solution.

Find out more about our solutions for nanolithography, nanofabrication and reverse engineering.


The areas of applications and fields that use Raith systems could hardly be more diverse; from fundamental research in nanophysics and nanomedicine, optoelectronics and material science to quantum technology, the possibilities are endless. Here are a few examples to give you an idea of what our customers are achieving with Raith system technology.

Check out some examples of nanotechnology applications - and be inspired!


EBL webinar series available on demand

Our second webinar series covered different aspects of electron beam lithography such as relevant performance parameters, large area imaging, 1D and 2D materials, metrology and many more. All three webinars are available on demand now.

Watch now!

Raith Online User Meeting Europe 2020

MNE 2020 was unfortunately canceled, but Raith is still planning to bring our user community together online. You are cordially invited to attend the "Raith User Meeting Europe" during the week of September 14 (the week what would have been MNE), to be held online using GoToWebinar.

Holding the User Meeting online gives us the opportunity to offer a much more detailed program to fit your specific needs. Please click here for further information and to sign up

Raith joins MIT.nano Consortium

We are proud to let you know that MIT.nano has announced Raith joined the MIT.nano Consortium as the twelfth founding member.


Demo lab opening in Best

We are happy to announce the opening of our brand new clean room lab in Best, Netherlands!

This new lab, close to our office and production location in Best, Netherlands gives us the perfect opportunity to offer our customers a closer look and perfect testing environment on the Raith EBPG 5200 for running exposures and the Raith eLINE for SEM imaging and metrology of results.

Webinar series available on demand now

We had a great time launching our live webinar series about FIB-SEM nanofabrication with the VELION.
If you missed it or just want to rewatch the 3 episodes of this webinar, click here.

Safe. Together.

In these challenging times we are still there for each other and for our customers! Worldwide we are finding ways to work together from a distance and want you to get a little inside. Greetings from us to you. Take care and let's stay safe together!

Support and sales information during COVID19 virus spread

Raith took action in containment and slowing down of the COVID19 virus spread. We reworked our processes and workflows such that support and sales information are available via the contact points and telephone numbers listed at

Technical support and service is offered online and onsite. The latter is subject to the frame of public travel restrictions. Spare parts are in stock and will be shipped via the established channels.

Order desks at all offices are working.

Raith factory workshops and training courses are cancelled and will be repeated as soon as the situation will allow. Please check the  for updates.


Raith delivers its new FIB-SEM VELION to Fondazione Bruno Kessler (FBK)

Raith, the global leading manufacturer of nanofabrication instrumentation, has delivered its VELION system to the Center for Materials and Microsystems of FBK – Fondazione Bruno Kessler in Trento, Italy, a research institute that aims at results of excellence in science and technology with particular emphasis on interdisciplinary approaches and their applicative dimension. 

Download the Press Release here

Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Join us for a symposium on Direct Write, Optical, Ion and Electron Beam Lithography at the University of Stuttgart from February 18-19, 2020.

This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genysis and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.

Don't miss the opportunity to get a broad overview of different aspects of nanolithography and to meet experts in all sorts of nanolithography disciplines and sign up now

Winner announcement Raith Micrograph Award 2019

Congratulations to this year's winner of the Raith Micrograph Award: Sergey Gorelick from Monash University, Australia, Martin Wolff from University of Münster, Germany and Nadia Ligato from NEST CNR-Nano, Italy. Find out who won an art award and take a closer look at the winner micrographs here

Raith’s PIONEER Two helped to detect “Big Bang molecule”

The first astrophysical detection of the helium hydride ion hit the news in April, immediately generating massive interest. The ion was the first molecule that formed after the Big Bang but could never before be detected in interstellar medium. With GREAT’s (German REceiver for Astronomy at Terahertz frequencies) far-infrared spectrometer onboard the flying observatory SOFIA (Stratospheric Observatory For Infrared Astronomy) detection was now made possible, offering a glance at the history of the early Universe. A central part of the receiver was fabricated with the help of a Raith PIONEER Two system: The NbN Hot-Electron-Bolometers used to down-convert the incoming THz signals to amplifiable GHz frequencies were designed and patterned at the microfabrication laboratory of University of Cologne’s I. Physikalisches Institut.

Read the press release from MPI here: 

Accelerate your FIB process

Download our new Application Note

Learn how a standard adhesive tape can help overcome the relatively slow patterning speed of direct FIB milling. Our new application note describes the sketch & peel approach in detail and also investigates the change in outcome when using different ion species. Download it here:

Ausbildung bei Raith

Bekomme einen Einblick in die verschiedenen Ausbildungsmöglichkeiten beim weltweit führenden Hersteller von Systemen zur Nano- und Mikrofabrikation.

Schau dir hier das Video an:

New Management at Raith China

After a successful start of Raith China, General Manager Xiaoyu Sun hands over her duties to Yue Tian as Genaral Manager and Truman Zhu as Vice general Manager.

Read today´s press release:

MEMS-tunable dielectic metasurface lens - new publication in Nature Communications

Congratulations to our customer Prof. Andrei Faraon from Caltech for his achievements in MEMS-integrated metasurfaces!

A recently published article in Nature Communications demonstrates the work of his group which paves the way towards MEMS-integrated metasurfaces as a platform for tunable and reconfigurable optics.

New possibilities for nanopatterning: Application Note on Organic Ice Resist

Our new application note by A. Han et al. from DTU (Technical University of Denmark) explains the advantages of negative-tone direct-write Organic Ice Resist processes which eliminate the solvent development and drying required for EBL, thus allowing for further sample processing either in situ or ex situ.

Read how the newly discovered method opens new possibilities for nanopatterning here:

Micrograph Award winner success story

Paul Kim from the University of Alberta, Canada, our recent Micrograph Award winner redeemed his prize and took a trip to the École de physique des Houches in France. Read the whole success story here:

5 reasons why Raith EBL systems offer the best solution for fast and easy DFB laser fabrication

The need for DFB laser is continuously increasing and with it the need to create precise gratings fast and easy. Find out the 5 reasons why Raith's EBL tools are proven as the best way to tackle the challenges given by DFB laser makers here:

New FIB-SEM for FIB-centric nanofabrication

We are proud to present VELION, the new FIB-SEM for FIB-centric nanofabrication. With its unique set-up of a vertical FIB-column it allows for versatile use in four different operation modes.  Find out all about the FIB-SEM where FIB truly comes first

Gips-Schüle Research Award for Ultracompact Photodetector

Congratulation to our customers at Karlsruhe Institute of Technology (KIT) who received the Gips-Schüle Research Award for the World’s Smallest Photodetector!

Sascha Mühlbrandt, Christian Koos, and Manfred Kohl of KIT’s Institute of Microtechnology/Institute of Photonics and Quantum Electronics were honored for their work on plasmonic photodetectors which combine an ultra-compact footprint with electro-optical bandwidths of hundreds of GHz.

More detailed information can be found in the paper "Silicon-plasmonic internal-photoemission detector for 40  Gbit/s data reception" which was published in Optica:

With the EBPG5200 at IMT the record-breaking ultracompact devices can be fabricated within a week. Nowadays their architecture can even be expanded from three to four layers which is only possible due to the high overlay accuracy of the patterning system. We are excited for our customers and eager to see where the research will lead in the future.

Press Releas KIT


Winner announcement Raith Micrograph Award 2017

Congratulations to this year's winner of the Raith Micrograph Award: Paul H. Kim, Sasa Gazibegovic and Maurangelo Petruzella. Find out who won an art award and take a closer look at the winner micrographs here

VOAYAGER installation in one minute

Time lapse video

The University of Bristol now has a Raith VOYAGER and you can watch it being installed in one minute!

Scientific poster now available as download

Raith employees continuously contribute to the scientific program of various exhibitions with posters on different topics.
With our new download section, we make the latest ones available to you! Check it out here

Raith splits the atom

DFB laser grating writing newly defined

Find out how gratings with sub-0.1 nm pitch fidelity were achieved:

Webinar Perfecting Large Area, High Resolution SEM Imaging with 3D-Stitching

Have you already watched our webinar "Perfecting Large Area, High Resolution SEM Imaging with 3D-Stitching"? It's available on demand here:

C2N-CNRS-UPSud and Raith continue cooperation over advanced FIB nanofabrication technologies

Marcoussis / Dortmund September, 2017 - Raith and C2N-CNRS-UPSud have entered into a new research cooperation agreement over exploration of advanced technologies for far sub-10 nm nanopatterning, as required for newest generation electronic, magnetic, photonic, and plasmonic nanostructures.

Raith Instrument Technologies

Did you know that Raith Instruments also enable Automated Large Area SEM Image Acquisition, Automated CD SEM Metrology, Linewidth and Placement Measurements as well as Electrical Probing and FIB nanofabriaction?

Find out all about it here

Symposium at Stanford University on direct-write applications - a huge success

Raith and Heidelberg Instruments recently organized a symposium on direct write, optical, ion and electron beam lithography in close collaboration with their joint customer Stanford Nanofabrication Facility (SNF). 

Read all about it here:

New CHIPSCANNER brochure available

Download it now!

Learn everything you need to know about the large-area 3D SEM imaging solution CHIPSCANNER in the updated and extended new CHIPSCANNER Series System Product Brochure or here.

Download it here

New Multi Sample Exposure Package

The easiest nanolithography software user interface now available

Raith's new Multi Sample exposure package simplifies and consolidates exposures of multiple samples from different users and user levels in a single run. It offers easy access to nanolithography for users with or without experience in electron beam lithography and is a big step towards a nano-printer.

Find out how your nanolithography job can now get done easier and faster than ever before

New publication on quantum technology

ionLiNE Plus proofs unique capabilities

A research group headed by Prof. Weibo Gao at Nanyang Technological University in Singapore, in cooperation with the Raith application team, has recently shown that ion implantation with a focused Si++ ion beam can be employed for creating active silicon vacancies in SiC.

Read more about how the ionLINE Plus permitted the scalable fabrication with a dose control down to a few ions per spot.

New Newsletter available now!

Get the latest news on Raith products, applications and the Raith team!

ZEISS and Raith join forces for Helium Ion Microscopy and Nanofabrication

New partnership strengthens global sales activities for unique ZEISS ORION NanoFab platform

The Microscopy business group of ZEISS and the Raith Group agreed to unite their sales and promotional activities for ZEISS ORION NanoFab, the only helium-ion-microscope in the world. ORION NanoFab fabricates sub-10 nm structures and images at 0.5 nm.

Iowa students use microfabrication to improve future

Watch the video showing the use of the VOYAGER at the University of Iowa

CBS 2 covers a story about the University of Iowa using a Raith VOYAGER to improve the future with microfabrication

VOYAGING beyond space using microfabrication

Read the article in which the University of Iowa explains how it uses its electron beam lithography system VOYAGER

Picture of a nanofabrication system brochure

Read about exciting research, impressive results or technical details in our Download section. We have provided a selection of application notes, product brochures, newsletters, and more to provide you even deeper insights into the nanofabrication world. Browse our Download section and download the PDFs.

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